CAS: 33861-17-5; Trimethyl(Phenylselanyl)Silane

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7072-01-7 2217-60-9 2040-26-8

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CAS号75-77-4 三甲基氯硅烷 | CAS号1666-13-3 二苯基二硒醚 | CAS号993-07-7 三甲基硅烷 | CAS号645-96-5 5-苯基-1,3,4-恶二唑-2-硫醇 | CAS号72017-00-6 Thallous Phenyl... | CAS号14856-73-6 (4-Nitrobenzyl)... | CAS号14629-56-2 (4-Methoxybenzy... | CAS号14856-75-8 (α-Methylbenzyl... | CAS号18023-53-5 (2-Ethylhexylox... | CAS号18023-52-4 1-Methylheptyl(... | CAS号6996-92-5 苯亚硒酸 | CAS号2857-97-8 三甲基溴硅烷 | CAS号1666-13-3 二苯基二硒醚 | CAS号420-56-4 三甲基氟硅烷

合成工艺路线路线简述

    📜二苯基二硒醚 以68%的收率获得产物
    参考文献:Detty M. R.,J. Org. Chem.,1979,44,No 25,4528-4531
    标题:Detty M. R.,J. Org. Chem.,1979,44,No 25,4528-4531

    海关参考信息

    专利信息


    专利号:US-8507040-B2
    优先权日:2008-05-08
    标题:Binary and ternary metal chalcogenide materials and method of making and using same
    发明人:XIAO MANCHAO; LEI XINJIAN; YANG LIU
    权利人:XIAO MANCHAO; LEI XINJIAN; YANG LIU; AIR PROD & CHEM
    摘要:This invention discloses the synthesis of metal chalcogenides using chemical vapor deposition (CVD) process, atomic layer deposition (ALD) process, or wet solution process. Ligand exchange reactions of organosilyltellurium or organosilylselenium with a series of metal compounds having neucleophilic substituents generate metal chalcogenides. This chemistry is used to deposit germanium-antimony-tellurium (GeSbTe) and germanium-antimony-selenium (GeSbSe) films or other tellurium and selenium based metal compounds for phase change memory and photovoltaic devices.

    专利号:US-8765223-B2
    优先权日:2008-05-08
    标题 :Binary and ternary metal chalcogenide materials and method of making and using same
    发明人:XIAO MANCHAO; YANG LIU
    权利人:XIAO MANCHAO; YANG LIU; AIR PROD & CHEM
    摘要:This invention discloses the synthesis of metal chalcogenides using chemical vapor deposition (CVD) process, atomic layer deposition (ALD) process, or wet solution process. Ligand exchange reactions of organosilyltellurium or organosilylselenium with a series of metal compounds having neucleophilic substituents generate metal chalcogenides. This chemistry is used to deposit germanium-antimony-tellurium (GeSbTe) and germanium-antimony-selenium (GeSbSe) films or other tellurium and selenium based metal compounds for phase change memory and photovoltaic devices.

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    ✅ COA系统入驻 | 共享模式

    合成参考文献


    摘要:Baker, A.; Wirth, T., Science of Synthesis Knowledge Updates, (2017) 1, 198.
    摘要:Baker, A.; Wirth, T., Science of Synthesis Knowledge Updates, (2017) 1, 199.
    摘要:Baker, A.; Wirth, T., Science of Synthesis Knowledge Updates, (2017) 1, 194.
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