CAS: 12070-07-4; Ditantalum Carbide

📜Potassium Heptafluorotantalate置于glassy Carbon Or Carbon Braid体系中,用 Melt 用作溶剂,化学反应生成碳化钽,甲烷,钽
参考文献:Preparation Of Tantalum Carbide Layers On Carbon Using The Metalliding Process
标题:Preparation Of Tantalum Carbide Layers On Carbon Using The Metalliding Process
摘要:This Work Concerns The Preparation Of Tantalum Carbide Films On Carbon-Based Substrates Using The Metalliding Process In Lif/naf Molten Medium (60-40 Mol%),Containing Tantalum Hepta. Uorotantalate Ions Taf(7)(2-),In The 800-900 Degrees C Temperature Range. The Process Uses A Metalliding Cell Symbolised As: (+) C,Tac(X)/lif-Naf-K(2)Taf(7)/ta(-) Involving The Dissolution Of Ta At The Anode And The Reduction Of Ta Ions In Tac(X) At The Cathode. The Experiments Of This Process Were Performed With Different Carbon Substrates As Cathodic Material: Graphite,Glassy Carbon And Carbon Braid. Samples Analysis (Sem-Eds And Xrd) After Metalliding Showed The Formation Of Tantalum Carbides (Tac And Ta(2)C) At The Surface Of The Substrate At A Relatively Low Temperature. A Kinetic Study,Based On The Control Of The Cathodic Reaction By The Intermetallic Diffusion,Allowed The Diffusion Parameters,Such As Ta/c Diffusion Coefficient,To Be Determined At Several Temperatures. Furthermore,The Results Are Shown To Be Independent Of The Type Of Carbon Substrate. (C) 2008 Elsevier B.V. All Rights Reserved.
Doi:10.1016/j.Jallcom.2008.04.014