CAS: 17906-35-3; Hydroxy-Tris(2-Methylbutan-2-Yloxy)Silane

上下游产品

(Ot-am)3SiCl1-chloroacetophenone

📜Tri-Tert.-Amyloxy-Chlorsilan置于pyridine体系中,化学反应生成三(叔-五氧代)硅烷醇
参考文献:Gmelin Handbuch Der Anorganischen Chemie,Gmelin Handbook: Si: Mvol.C,135,Page 374-376
标题:Gmelin Handbuch Der Anorganischen Chemie,Gmelin Handbook: Si: Mvol.C,135,Page 374-376

专利信息

专利号:US-9663546-B2
优先权日:2013-07-26
标 题 :Metal amides of cyclic amines
发明人：GORDON ROY GERALD
权利人:HARVARD COLLEGE
摘要:Compounds, and oligomers of the compounds, are synthesized with cyclic amine ligands attached to a metal atom. These compounds are useful for the synthesis of materials containing metals. Examples include pure metals, metal alloys, metal oxides, metal nitrides, metal phosphides, metal sulfides, metal selenides, metal tellurides, metal borides, metal carbides, metal silicides and metal germanides. Techniques for materials synthesis include vapor deposition (chemical vapor deposition and atomic layer deposition), liquid solution methods (sol-gel and precipitation) and solid-state pyrolysis. Suitable applications include electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices. The films have very uniform thickness and high step coverage in narrow holes.

专利号:US-8900467-B1
优先权日:2013-05-25
标 题 :Method for making a chemical contrast pattern using block copolymers and sequential infiltration synthesis
发明人：CHAPUIS YVES-ANDRE; RUIZ RICARDO; WAN LEI
权利人:HGST Netherlands BV
摘要:A method for making a chemical contrast pattern uses directed self-assembly of block copolymers (BCPs) and sequential infiltration synthesis (SIS) of an inorganic material. For an example with poly(styrene-block-methyl methacrylate) (PS-b-PMMA) as the BCP and alumina as the inorganic material, the PS and PMMA self-assemble on a suitable substrate. The PMMA is removed and the PS is oxidized. A surface modification polymer (SMP) is deposited on the oxidized PS and the exposed substrate and the SMP not bound to the substrate is removed. The structure is placed in an atomic layer deposition chamber. Alumina precursors reactive with the oxidized PS are introduced and infuse by SIS into the oxidized PS, thereby forming on the substrate a chemical contrast pattern of SMP and alumina. The resulting chemical contrast pattern can be used for lithographic masks, for example to etch the underlying substrate to make an imprint template.

专利号:US-7064227-B1
优先权日:2004-12-09
标 题:Precursors for silica or metal silicate films
发明人：LEI XINJIAN; RULKENS RON
权利人:AIR PROD & CHEM
摘要:A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.

专利号:US-10954139-B2
优先权日:2015-12-11
标 题:Oleophilic foams for oil spill mitigation
发明人：DARLING SETH B; ELAM JEFFREY W; MANE ANIL U
权利人:UCHICAGO ARGONNE LLC
摘要:A method of fabricating an oleophilic foam includes providing a foam comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD) or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the foam to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The foam is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with an oleophilic material.

专利号:US-12043893-B2
优先权日:2017-08-24
标题:Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof
发明人：KING DAVID; DAMERON ARRELAINE; TREVEY JAMES; LICHTY PAUL; ARGO ANDREW; BOURGOIS KYLE; RAGONESI JAMES; INGHAM KYLE; JACKSON DAVID; TRACY RYON; NGUYEN NGHI; LYON ADAM; VILLAGOMEZ JOSE; CURRY GARRETT
权利人:FORGE NANO INC
摘要:A system, apparatus and method are provided for processing articles. The system includes subsystems for synthesizing, pre-treating, conducting a vapor phase coating process and post-treating articles in the form of powders and solid or porous workpieces. The apparatus permits vapor phase synthesis, treatment and deposition processes to be performed with high efficiency and at high overall throughput. The methods include converting solids, liquids or gases into gaseous and solid streams that can be separated or exchanged with or without treatment and/or coating steps, and produce optimized composite articles for specific applications.

专利号:US-11351478-B2
优先权日:2018-09-06
标题 :Oil skimmer with oleophilic coating
发明人：DARLING SETH B; ELAM JEFFREY W
权利人:UCHICAGO ARGONNE LLC
摘要:A method of fabricating an coating includes providing a coating comprising a base material. The base material is coated with an inorganic material using at least one of an atomic layer deposition (ALD), a molecular layer deposition (MLD), or sequential infiltration synthesis (SIS) process. The SIS process includes at least one cycle of exposing the coating to a first metal precursor for a first predetermined time and a first partial pressure. The first metal precursor infiltrates at least a portion of the base material and binds with the base material. The coating is exposed to a second co-reactant precursor for a second predetermined time and a second partial pressure. The second co-reactant precursor reacts with the first metal precursor, thereby forming the inorganic material on the base material. The inorganic material infiltrating at least the portion of the base material. The inorganic material is functionalized with a material.