专利号:US-11400438-B2 优先权日:2018-12-05 标 题 :Synthesis and immobilization of a ferrous sulfite catalyst and method of degrading fluorinated organic chemicals in aqueous media 发明人:DIONYSIOU DIONYSIOS D; ABDELRAHEEM WAEL H M; NADAGOUDA MALLIKARJUNA N 权利人:UNIV CINCINNATI; THE US ADMINISTRATOR OF THE U S ENVIRONMENTAL PROTECTION AGENCY 摘要:A composition includes an aqueous solution including at least one fluorinated organic compound; and a reaction product of a source of iron(II) and a source of sulfite in the presence of water and molecular hydrogen. A method of making a catalyst includes reacting a source of iron(II) and a source of sulfite in the presence of water and molecular hydrogen. The water may include less than or equal to 1 weight percent dissolved molecular oxygen. The catalyst may be used for degrading fluorinated organic chemicals in aqueous media.
专利号:US-4273947-A 优先权日:1979-01-31 标 题:Hydrogenation of fluorine-containing carboxylic acids 发明人:NOVOTNY MIROSLAV 权利人:ALLIED CHEM 摘要:A process is described for the heterogeneous hydrogenation of fluorine-containing alkyl, cycloalkyl, and benzene carboxylic acids to the corresponding primary alcohols. The hydrogenation can be carried out in the liquid or vapor phase in the presence of a solid rhodium or iridium catalyst, employed as the metal, metallic oxide, or mixture thereof. In the liquid phase, the hydrogenation can be carried out batchwise under mild conditions of temperature and pressure, preferably at about 50°-150° C. and about 5-15 atmospheres, in an atmosphere containing hydrogen gas. A preferred embodiment is the hydrogenation of trifluoroacetic acid in the liquid phase to 2,2,2-trifluoroethanol, said alcohol being useful as an intermediate in the synthesis of the anesthetic, isoflurane, CF 3 CHClOCHF 2 .
专利号:US-8053161-B2 优先权日:2006-09-25 标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition 发明人:WADA KENJI; SAEGUSA HIROSHI 权利人:FUJIFILM CORP 摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.
专利号:US-9709891-B2 优先权日:2005-12-09 标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition 发明人:KANDA HIROMI; KANNA SHINICHI 权利人:FUJIFILM CORP 摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.
专利号:US-6093415-A 优先权日:1997-02-12 标题:Synergistic juvenoid chitin synthesis inhibitor termiticide compositions 发明人:KARR LAURA L; SBRAGIA RONALD J 权利人:DOW AGROSCIENCES LLC 摘要:Combinations of a chitin synthesis inhibitor (e.g. hexaflumuron, flufenoxuron, lufenuron, and dimiin) with a juvenile hormone mimic (e.g. methoprene and pyriproxyfen) afford synergistic activity against termites.
专利号:US-8679724-B2 优先权日:2005-12-09 标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
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合成参考文献
摘要:S118 | PFASFCCMIGEX | 68 PFAS in Migrating & Extractable Food Contact Chemicals (FCCmigex) | DOI:10.5281/zenodo.11090482 摘要:S25 | OECDPFAS | List of PFAS from the OECD | DOI:10.5281/zenodo.2648775 摘要:S95 | PFASANEXCH | PFAS List from the NORMAN PFAS Analytical Exchange Activity | DOI:10.5281/zenodo.6384309 摘要:S125 | FLUOROIONS | Fluorinated Ionic Liquids Suspect List | DOI:10.5281/zenodo.15348301. 摘要:S124 | IONICLIQUIDS | Ionic Liquids Suspect List | DOI:10.5281/zenodo.15348268.