CAS: 92343-46-9; 6-Hydroxyhexahydro-2H-3,5-Methanocyclopenta[b]Furan-2-One
该化合物是一个化学化合物,其特性是独特的三环结构,包括一个氢氧基组和一个碳基组(C=O),作为功能组;该化合物的特点是一个有助于其稳定性和反应的引信环系统;三环框架内的氧原子(氧基)的存在增强了其化学特性,有可能影响其溶解性和与其他分子的相互作用;氢氧基化合物组可以参与氢联结,这可能影响到其物理特性,如沸点和熔点,以及极溶剂中的溶性;此外,碳基组可参与各种化学反应,包括核生殖器添加和凝聚反应;
- 英文名称6-Hydroxyhexahydro-2H-3,5-Methanocyclopenta[b]Furan-2-One
- 中文名称2-羟基-4-氧杂三环(4.2.1.03,7)-5-壬酮
- IUPAC名称6-hydroxyhexahydro-2H-3,5-methanocyclopenta[b]furan-2-one
- 其它别名6-羟基六氢-2H-3,5-甲基桥连环戊[b]呋喃-2-酮; N-Hydroxy-5-Norbornene-2,3-Second Imide
- CAS编号92343-46-9
- MFCD编号:MFCD00988184
- EINECS号:808-149-0
- 分子式:C8H10O3分子量:154.16
- 产品CID: 1961254
- 产品分类有机原料→分子砌块→桥环类化合物→其它桥环类化合物
相似化合物
61380-96-9 254900-07-7 931398-54-8物理性质
MSDS等安全信息
欧盟法规
ECHA物质C&L通报合成工艺路线路线简述
- 120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Hydrogen Peroxide Catalysts: Tungstic Acid (H2Wo4) Solvents: Water
标题:Preparation Of 5-Hydroxy-2,6-Norbornanecarbolactone And Its (Meth)Acrylate Ester From Endo-Rich 5-Norbornene-2-Carboxylic Acids
参考文献:Japan]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Formic Acid,Hydrogen Peroxide Solvents: Water; 6 H,< 50 °C1.2 Reagents: Sodium Sulfite Solvents: Water1.3 Catalysts: Potassium Carbonate Solvents: Methanol; 1 H,Rt
标题:Lactone-Containing Compounds,Polymers,Resist Compositions,And Patterning Method
参考文献:United States]
= 92343-46-9 [标题:Reaction Conditions
标题:Preparation Of Lactones
参考文献:Japan]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Hydrogen Peroxide Catalysts: Methyltrioxorhenium Solvents: Chloroform
标题:Regioselective Hydroxylactonization Of γ,δ-Unsaturated Carboxylic Acids With Hydrogen Peroxide Catalyzed By Methyltrioxorhenium
作者:Tan,Haisong; Espenson,James H.
参考文献:Journal Of Molecular Catalysis A: Chemical 日期:1999 卷标:142(3) 页码:333-338]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Hydrogen Peroxide Catalysts: Tungstic Acid (H2Wo4) Solvents: Tert-Butanol,Water
标题:Process For Producing Hydroxylactone
参考文献:World Intellectual Property Organization]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Peracetic Acid Solvents: Ethyl Acetate
标题:Process For Preparing 5-Hydroxy-3-Oxatricyclo[4.2.1.04,8]Nonan-2-One Derivatives
参考文献:Japan]
1195-12-6 = 92343-46-9
反应条件:1.1 Reagents: Hydrogen Peroxide,Tungsten Hydroxide Oxide (W(Oh)2O) Solvents: Water; 50 - 60 °C; Overnight,50 - 60 °C
标题:Synthesis And Characterization Of 2-Hydroxy-4-Oxatricyclo [4,2,1,03, 7] Nonan-5-One
作者:Yang,Zhen-Qiang; Si,Jiang-Kun; Jiang,Wei-Peng; Li,Jiang-Tao; Yang,Rui-Na
参考文献:Huagong Jishu Yu Kaifa 日期:2012 卷标:41(3) 页码:1-2]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Formic Acid,Hydrogen Peroxide Solvents: Water; 6 H,48 - 50 °C; 10 H,50 °C1.2 Reagents: Sodium Hydroxide Solvents: Water; Ph 7.5
标题:Process For The Preparation Of Alcohol Derivatives
参考文献:Japan]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Formic Acid,Hydrogen Peroxide Solvents: Water; 6 H,48 - 50 °C; 10 H,50 °C; 50 °C -> 15 °C1.2 Reagents: Sodium Hydroxide,Sodium Sulfite Solvents: Water; Ph 7.5
标题:Process For The Preparation Of Epoxide Derivatives
参考文献:Japan]
= 92343-46-9
反应条件:1.1 165 °C1.2 14 H,40 °C; 6 H,40 °C1.3 Reagents: Sodium Hydroxide Solvents: Tert-Butyl Methyl Ether,Water; 10 Min,25 °C; 10 Min,Ph 12 - 13,25 °C1.4 Reagents: Hydrochloric Acid Solvents: Water; Ph 2 - 3,25 °C1.5 Reagents: Formic Acid,Hydrogen Peroxide; 8 H,Rt; 1 H,60 °C1.6 Reagents: Potassium Carbonate Solvents: Methanol; 3 H,20 °C
标题:Method For Preparing Photoresist Resin Monomer And Intermediate Thereof
参考文献:China]
120-74-1 = 92343-46-9
反应条件:1.1 Reagents: Formic Acid,Hydrogen Peroxide Solvents: Water; 20 - 30 °C; 6 H,48 - 50 °C; 10 H,50 °C1.2 Reagents: Sodium Hydroxide Solvents: Water; Ph 7.5
标题:Acrylic Ester Derivative,High-Molecular Compound And Photoresist Composition
参考文献:World Intellectual Property Organization]
= 92343-46-9 [标题:Reaction Conditions
标题:Preparation Of Lactone Skeleton-Containing Fluoroalkylacrylates
参考文献:Japan]
= 92343-46-9 [标题:Reaction Conditions
标题:Preparation Of Lactones As Materials For Photoresists For Argon Fluoride Laser Exposure
参考文献:Japan
📜5-降冰片烯-2-羧酸置于甲酸,双氧水,Potassium Carbonate体系中,用 甲醇 作为反应溶剂,化学反应 12.0H,反应生成 2-羟基-4-氧杂三环[4,2,1,0 37]-5-壬酮
参考文献:一种光刻胶树脂单体及其中间体的制备方法
标题:一种光刻胶树脂单体及其中间体的制备方法
摘要:本发明提供一种光刻胶树脂单体及其中间体的制备方法.该光刻胶树脂中间体的制备方法包括如下步骤:A)进行解聚得到b)将与反应得到c)将步骤b)的反应产物进行碱化处理,酸化处理和浓缩.该光刻胶树脂单体的制备方法包括如下步骤:将与氧化剂进行环氧化反应,然后进行内酯化反应;然后与进行酯化反应,获得光刻胶树脂单体.本发明光刻胶树脂单体及其中间体的制备方法收率高,纯度高,尤其在百公斤级制备下仍然具有收率高和纯度高的有益效果.
海关参考信息
- 2905122000-异丙醇
2905310000-1,2-乙二醇
2905320000-1,2-丙二醇
2909110000-乙醚 - 💡 提示：海关信息按照顺序优先匹配，如需确认的海关信息，请参考相关资料。
- 详情请参考：📖 海关编码查询和海关进出口税则
专利信息
专利号:US-7399806-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers
发明人：BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG
权利人:SYMYX TECHNOLOGIES INC
摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
供应商参考报价(招募中)
品牌试剂参考报价(招募中)
📌 第三方产品分析报告
合成参考文献
参考文献:10.1007/s11178-005-0034-0
摘要:Kas’yan LI, Isaev AK, Kas’yan AO, Golodaeva EA, Karpenko DV, Tarabara IN. Amides containing two norbornene fragments. Synthesis and chemical transformations. Russian Journal of Organic Chemistry. 2004 Oct;40(10):1415–26. doi: 10.1007/s11178-005-0034-0.
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