CAS: 4694-12-6; 2,4,4-Trimethylcyclopentan-1-One

相似化合物

20500-49-6 4541-32-6 4694-11-5

上下游产品

CAS号10275-88-4 CYCLOPENTANECAR... | CAS号10276-21-8 氧化异佛尔酮 | CAS号126-81-8 醛试剂 | CAS号3937-59-5 2,4,4-Trimethyl... | CAS号78-59-1 异佛尔酮 | CAS号503-44-6 3,5,5-trimethyl... | CAS号116-02-9 3,3,5-三甲基环已醇 | CAS号20624-63-9 3,3-dimethyl-5-... | CAS号20309-77-7 反式-1,1,3,4-四甲基环戊烷 | CAS号4516-69-2 1,1,3-三甲基环戊烷 | CAS号6949-23-1 4-甲基-3-硝基苯磺酰胺 | CAS号19265-05-5 1,1,3-trimethyl... | CAS号597-43-3 2,2-二甲基琥珀酸 | CAS号118075-31-3 2,4,4-trimethyl...

📜3,3,5-三甲基环己酮置于氢氧化钾,Lead Peroxide,硫酸,溴,溶剂黄146体系中,化学反应生成 2,4,4-三甲基环戊酮
参考文献:Wallach,Justus Liebigs Annalen Der Chemie,1918,Vol. 414,P. 311
标题:Wallach,Justus Liebigs Annalen Der Chemie,1918,Vol. 414,P. 311

专利信息

专利号:US-8674143-B2
优先权日:2008-10-15
标 题 :Synthesis of green ketone intermediate
发明人：BONRATH WERNER; LETINOIS ULLA; SCHUETZ JAN
权利人:BONRATH WERNER; LETINOIS ULLA; SCHUETZ JAN; DSM IP ASSETS BV
摘要:A process for the preparation of 1-ethynyl-3,3-dimethylcyclohexan-1-ol from dimedone by a reaction sequence of reduction and ethynylation and its further transformation into green ketone.

专利号:US-5698600-A
优先权日:1995-10-24
标题:Process for the production of bisphenols with the use of new cocatalysts
发明人：WULFF CLAUS; FENNHOFF GERHARD; EITEL ALFRED
权利人:BAYER AG
摘要:The invention relates to the synthesis of bisphenols from monophenols and carbonyl compounds such as aldehydes and ketones with concentrated mineral acids such as hydrochloric acid and/or hydrogen chloride gas as acid catalysts and a mercaptan as cocatalyst, which is fixed by an ion-pair bond to a matrix insoluble in the reaction medium.

专利号:EP-2128118-A1
优先权日:2008-05-28
标 题:Synthesis of mono-ketones from 1,3-diketones
发明人：BONRATH WERNER; LETINOIS ULLA
权利人:DSM IP ASSETS BV
摘要:The present invention is directed to a process for the manufacture of a mono-ketone comprising the step of hydrogenating a 1,3-diketone with hydrogen in the presence of a bifunctional catalyst having an acid functionality and a hydrogenation functionality.

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

专利号:WO-2009144136-A1
优先权日:2008-05-28
标题:Synthesis of mono-ketones from 1,3-diketones