CAS: 84246-29-7; 1,1,2,2,3,3-Hexafluoropropane-1,3-Disulfonimide
该化合物是氟化磺酰胺化合物,其独特结构包括六氟丙烷脊柱和两个磺酰胺功能组,其特点是其高热稳定性和极地溶剂的溶性极佳,使之适合各种应用,特别是在电化学领域和锂离子电池中的电解剂,其氟性能低挥发性和高化学抗药性,在要求化学环境方面十分有利.此外,全氟辛烷磺酸组的存在有助于其离心传导性,提高了其在电子化学系统中的性能.由于该化合物具有潜在的再活动性,而且使用期间需要适当的安全措施,该化合物通常得到谨慎处理.
- 英文名称1,1,2,2,3,3-Hexafluoropropane-1,3-Disulfonimide
- 中文名称1,1,2,2,3,3-六氟丙烷-1,3-二磺酰亚胺
- IUPAC名称4,4,5,5,6,6-hexafluoro-1,3,2-dithiazinane 1,1,3,3-tetraoxide
- 其它别名4,4,5,5,6,6-Hexafluorodihydro-4H-1,3,2-Dithiazine 1,1,3,3-Tetraoxide; 4,4,5,5,6,6-Hexafluoroperhydro-1,3,2-Dithiazine 1,1,3,3-Tetraoxide; 1,1,2,2,3,3-Hexafluoropropane-1,3-Disulfonimide; 1,1,2,2,3,3-Hexafluoropropane-1,3-Disulfonimide>4,4,5,5,6,6-Hexafluoro-1,3,2-Dithiazinane 1,1,3,3-Tetraoxide; 4H-1,3,2-Dithiazine, 4,4,5,5,6,6-Hexafluorodihydro-, 1,1,3,3-Tetraoxide
- CAS编号84246-29-7
- MFCD编号:MFCD06200806
- EINECS号:680-103-0
- 分子式:C3HF6NO4S2分子量:293.17
- 产品CID: 1830926
- 产品分类有机原料 → 有机氟化合物 → 氟丙烷系列
物理性质
MSDS等安全信息
欧盟法规
ECHA物质C&L通报合成工艺路线路线简述
专利信息
专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.
专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.
专利号:US-11862794-B2
优先权日:2020-05-06
标题:Cost effective synthesis of oxide materials for lithium ion batteries
专利号:US-12211999-B2
优先权日:2020-05-06
标题:Cost effective synthesis of oxide materials for lithium ion batteries
发明人：XIAO JIE; BI YUJING
权利人:BATTELLE MEMORIAL INSTITUTE
摘要:Methods for synthesizing single crystalline Ni-rich cathode materials are disclosed. The Ni-rich cathode material may have a formula LiNi X Mn y M z Col 1-x-y-z O 2 , where M represents one or more dopant metals, x≥0.6, 0.01≤y<0.2, 0≤z≤0.05, and x+y+z≤1.0. The methods are cost-effective, and include methods for solid-state, molten-salt, and flash-sintering syntheses.
专利号:US-2024088382-A1
优先权日:2020-05-06
标题 :Cost effective synthesis of oxide materials for lithium ion batteries
专利号:US-8679724-B2
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
供应商参考报价(招募中)
品牌试剂参考报价(招募中)
📌 第三方产品分析报告
合成参考文献
摘要:S25 | OECDPFAS | List of PFAS from the OECD | DOI:10.5281/zenodo.2648775
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