CAS: 61-78-9; 2-(4-Aminobenzamido)Acetic Acid

相似化合物

2645-07-0 1219805-41-0 1072902-66-9

上下游产品

4-nitrohippuric acid 4-amino-benzoic acid glycine 4-aminobenzoyl chloride N-(4-amino-benzoyl)-glycine ethyl esterN-(4-amino-benzoyl)-glycine ethyl ester 2-(4-cyanobenzamido)acetic acid N-(4-amino-3,5-diiodo-benzoyl)-glycineN-(4-amino-3,5-diiodo-benzoyl)-glycine N-[4-(N'-allyl-thioureido)-benzoyl]-glycineN-[4-(N'-allyl-thioureido)-benzoyl]-glycine

📜4-硝基苯甲酰氯置于palladium 10% On Activated Carbon,Sodium Hydroxide体系中,用 甲醇 作为反应溶剂,20.0~25.0 °C,100.0 Kpa 条件下,反应 2.0H,反应生成 对氨基马尿酸
参考文献:1,2,4-Triazole-Tethered Indolinones As New Cancer-Fighting Small Molecules Targeting Vegfr-2: Synthesis,Biological Evaluations And Molecular Docking
标题:1,2,4-Triazole-Tethered Indolinones As New Cancer-Fighting Small Molecules Targeting Vegfr-2: Synthesis,Biological Evaluations And Molecular Docking
摘要:靶向 Vegfr-2 信号通路是抗击胰腺癌和肝癌的不二法门.以美国 Fda 批准的血管内皮生长因子受体-2 抑制剂舒尼替尼为基础,设计并合成了新型吲哚啉-2-酮三唑混合物,作为具有血管内皮生长因子受体-2 抑制活性的抗肝癌和抗胰腺癌药物.对所有目标化合物的抗癌活性进行了评估,结果显示,这些化合物对 Panc1 细胞株的 Ic50 值为 0.17 至 4.29 µm,对 Hepg2 细胞株的 Ic50 值为 0.58 至 4.49 µm.为了探索不同取代基和 N-烷基化的影响,我们进行了广泛的 Sar 研究.对强效抗癌类似物 11D,11E,11G,11K 和 14C 的 Vegfr-2 抑制作用进行了评估,它们的 Ic50 值介于 16.3 到 119.6 Nm 之间,而索拉非尼的 Ic50 值为 29.7 Nm,化合物 11D 是活性最高的类似物.为了确认合成化合物的药物亲和性,还进行了一项硅学 Adme 研究.最后,对最有效的 Vegfr-2 抑制剂(11D)进行了分子对接模拟,证明其与 Vegfr-2 Atp 结合位点的重要氨基酸残基有很强的结合力.
DOI:10.3390/ph17010081

专利信息

专利号:US-9365532-B1
优先权日:2011-02-14
标题:Synthesis, composition and use of novel therapeutic and cosmetic Schiff base products formed by reaction of a carbonyl containing moeity with a transimination nucleophilic catalyst and the use of transimination nucleophilic catalysts to increase the rate at which carbonyl containing therapeutic and cosmetic actives form Schiff base products with biological amines
发明人：ISAACMAN STEVEN
权利人:ISAACMAN STEVEN; NANOMETICS LLC
摘要:The present invention relates to the synthesis, composition and use of novel moieties formed by reacting a transimination nucleophilic catalyst, molecular or polymeric, with carbonyl-containing therapeutic or cosmetic moieties. The resultant Schiff base product is highly reactive towards transimination with a biological amine. The catalyst and carbonyl-containing moiety can be molecular or polymeric, and the resultant chemical and physical properties of the Schiff base products can be engineered by appropriate selection of said catalyst. The present invention also relates to the synthesis, composition and use of novel moieties that are used as actives in sunless tanning preparations. The present invention also relates to the use of transimination nucleophilic catalysts to increase the rate at which a carbonyl-containing moiety reacts with a biological amine. The present invention also relates to the use of transimination nucleophilic catalysts to increase the rate and efficacy of commercial sunless tanning preparations. Improvements on stability and efficacy of said preparations are disclosed. While the invention has been described in terms of its preferred embodiments, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the appended claims. Accordingly, the present invention should not be limited to the embodiments as described above, but should further include all modifications and equivalents thereof within the spirit and scope of the description provided herein.

专利号:US-2024400861-A1
优先权日:2021-10-01
标题 :Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization Slurries
发明人：LARBIG GREGOR; KIRSCH PEER; HENGST MATTHIAS; SHI XIAOBO; STENDER MATTHIAS
权利人:VERSUM MAT US LLC
摘要:Synthesis of triazole- and/or triazolium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising triazole- and/or triazolium-based polymers; and water. The use of the synthesized triazole- and/or triazolium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

专利号:US-11842850-B2
优先权日:2016-01-22
标 题:High-voltage devices
发明人：KANER RICHARD BARRY; EL-KADY MAHER F
权利人:UNIV CALIFORNIA
摘要:The present disclosure provides supercapacitors that may avoid the shortcomings of current energy storage technology. Provided herein are supercapacitor devices, and methods of fabrication thereof comprising the manufacture or synthesis of an active material on a current collector and/or the manufacture of supercapacitor electrodes to form planar and stacked arrays of supercapacitor electrodes and devices. Prototype supercapacitors disclosed herein may exhibit improved performance compared to commercial supercapacitors. Additionally, the present disclosure provides a simple, yet versatile technique for the fabrication of supercapacitors through masking and etching.

专利号:WO-2024073211-A1
优先权日:2022-09-29
标题:Guanidinium-based polyionic liquids and their use as additives for chemical mechanical planarization slurries
发明人：LARBIG GREGOR; KIRSCH PEER; SHI XIAOBO
权利人:VERSUM MAT US LLC
摘要:Synthesis of guanidinium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising guanidinium-based polymers; and water. The use of the synthesized guanidinium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

专利号:US-2500296-A
优先权日:1945-07-23
标 题 :Synthesis of substituted pteridines

专利号:US-2025215130-A1
优先权日:2022-04-11
标 题:Polycationic Polymer Or Copolymer Having Different Cation Types For Slurries In Chemical Mechanical Planarization
发明人：LARBIG GREGOR; SHI XIAOBO
权利人:MERCK PATENT GMBH; VERSUM MAT US LLC
摘要:Synthesis of polycationic polymer or copolymer is disclosed. The polycationic polymer or copolymer are formed by at least one first cationic monomer and at least one second cationic monomer wherein the first cationic monomer and the second cationic monomer have different cationic groups; such as imidazolium group and non-imidazolium group. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising polycationic polymer or copolymer; and water are also disclosed. The use of the synthesized polycationic polymer or copolymer in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.