专利号:US-9187824-B2 优先权日:2011-10-07 标题 :Rapid synthesis of graphene and formation of graphene structures 发明人:FISHER TIMOTHY S; KUMAR ANURAG 权利人:PURDUE RESEARCH FOUNDATION 摘要:A process for rapid synthesis of few-layer graphene films on Cu foil by microwave plasma chemical vapor deposition (MPCVD). The plasma/metal interaction can be useful for a rapid synthesis of such thin films. The process can produce films of controllable quality from amorphous to highly crystalline by adjusting plasma conditions during growth processes of Ëœ100 sec duration and with little or no supplemental substrate heating. Films have been characterized using Raman spectroscopy, scanning electron microscopy, transmission electron microscopy and X-ray photoelectron spectroscopy. The results help to identify the stages involved in the MPCVD deposition of thin carbon films on Cu foil. In yet other embodiments, the films are doped during synthesis by introduction of nitrogen gas in the reactor. Raman spectroscopy, X-ray photoelectron spectroscopy, transmission electron microscopy and scanning tunneling microscopy reveal crystal structure and chemical characteristics. Nitrogen concentrations up to approximately 2 atomic % are observed. The growth process requires only a few minutes without supplemental substrate heating and offers a promising path toward large-scale synthesis of nitrogen-doped graphene films.
专利号:US-2013196019-A1 优先权日:2010-03-18 标 题:Silicon-containing block co-polymers, methods for synthesis and use 发明人:WILLSON C GRANT; BATES CHRISTOPHER M; STRAHAN JEFFREY; ELLISON CHRISTOPHER JOHN; MUELLER BRENNEN 权利人:WILLSON C GRANT; BATES CHRISTOPHER M; STRAHAN JEFFREY; ELLISON CHRISTOPHER JOHN; MUELLER BRENNEN; NAT UNIVERSITY OF SINAPORE 摘要:The present invention describes the synthesis of silicon-containing monomers and copolymers. The synthesis of a monomer, trimethyl-(2-methylenebut-3-enyl)silane (TMSI) and subsequent synthesis of diblock copolymer with styrene, forming polystyrene-block-polytrimethylsilyl isoprene, and synthesis of diblock copolymer Polystyrene-block-polymethacryloxymethyltrimethylsilane or PS-b-P(MTMSMA). These silicon containing diblock copolymers have a variety of uses. One preferred application is as novel imprint template material with sub-100 nm features for lithography.
专利号:WO-2023102600-A1 优先权日:2021-12-06 标题:Synthesis of amphiphilic block copolymers and polymeric nanofibers produced therefrom 发明人:ZETTERLUND PER B; ISHIZUKA FUMI; KIM HYUN JIN; CHATANI SHUNSUKE; NIINO HIROSHI 权利人:NEWSOUTH INNOVATIONS PTY LTD 摘要:The present disclosure relates to the field of synthesis of block copolymers, and polymeric nanofibers having a core-shell morphology produced therefrom. The present disclosure relates to the field of synthesis of block copolymers where one block is more hydrophobic than the other block and is a different composition. The disclosure also relates to uses of these polymeric nanofibers in various applications, such as reinforcing a polymeric matrix and for coatings applications.
专利号:US-2021130543-A1 优先权日:2019-10-30 标 题:Synthesis of cyanurate and multifunctional alcohol-based polyether acrylate for uv curable materials 发明人:YUAN ZHONGSHUN; XU CHUNBAO; WU WEI 权利人:YUAN ZHONGSHUN; XU CHUNBAO; WU WEI 摘要:Polyether (meth)acrylates based on cyanuric acid or substituted cyanuric acid and multifunctional alcohol, which optionally include triethanolamine units, have wide applications in UV curable adhesives, coatings, inks, sealants, paints or 3D printing. These polyether acrylates have rigid cyanurate structure endowing the material with extra strength and thermal stability. Furthermore, triethanolamine unit, when present, endows the material with anti-oxygen inhibition property in UV curing process. These polyether (meth)acrylates have low viscosity and high reactivity towards UV curing. The cured resins have high resilience and strength. The process of making the polyether (meth)acrylates includes the synthesis of trifunctional polyether polyols through controlled polymerization of propylene oxide using multifunctional alcohol (such as glycerol and sucrose), cyanuric acid or substituted cyanuric acid, and optionally triethanolamine, in the presence of a catalyst, followed by the synthesis of polyether (meth)acrylates through transesterification or through direct esterification of the trifunctional polyether polyols.
专利号:US-7705136-B2 优先权日:2005-02-25 标 题 :Synthesis of 3′-, or 5′-, or internal methacrylamido-modified oligonucleotides 发明人:GOLOVA JULIA B; CHERNOV BORIS K 权利人:UCHICAGO ARGONNE LLC 摘要:New modifiers were synthesized for incorporation of a methacrylic function in 3′-, 5′- and internal positions of oligonucleotides during solid phase synthesis. A modifier was used for synthesis of 5′-methacrylated oligonucleotides for preparation of microarrays by a co-polymerization method.
专利号:US-6512081-B1 优先权日:1997-07-21 标题:Synthesis of dithioester chain transfer agents and use of bis(thioacyl) disulfides or dithioesters as chain transfer agents 发明人:RIZZARDO ENZIO; THANG SAN HOA; MOAD GRAEME 权利人:E I DUPONT NEMOURS AND COMPANY; COMMW SCIENT IND RES ORG 摘要:This invention relates to the synthesis of dithiocarboxylic acid esters by reaction of bis(thioacyl) disulphides, thioacetals or vinylidane bis(thioether) with free-radicals (optionally in the presence of monomers). The invention also relates to processes for the synthesis of polymers utilising these dithioesters as polymerisation regulators (chain transfer agents) or to the use of bis(thioacyl) disulphides to generate dithioester chain transfer agents in situ.
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