CAS: 30496-78-7; Octahydrodimethyl-4,7-Methano-1H-Indene
该化合物是一种双环有机化合物,其独特结构包括一个引信环系统,具有独特的结构,具有饱和的碳氢化合物框架,与不饱和的化合物相比,具有较高的稳定性和低的再活性.其分子结构包括两个甲基组,造成其疏水性.一般情况下,这种化合物具有中等的波动性,可能具有中低至中度的沸点,取决于特定分子的相互作用.Octa hydhydhymethem4,7-methano-1H-indene可能没有色色或黄色色色,而且可能具有微弱的气味.这种化合物在有机溶解剂中溶解,但水溶解性很强,对非极性碳氢化合物十分常见.这种化合物可能会在有机合成中或作为生产更复杂的化学实体的中间体中找到应用.但是,应该遵守具体的安全和处理准则,与所有化学物质一样,以确保实验室或工业环境中的安全使用.
- 英文名称Octahydrodimethyl-4,7-Methano-1H-Indene
- 中文名称八氢二甲基-4,7-甲桥-1H-茚
- 其它别名4,7-Methanoindan,hexahydrodimethyl- (6CI); °Ctahydrodimethyl-4,7-methano-1H-indene; RJ 4; Tetrahydromethylcyclopentadiene dimer
- CAS编号30496-78-7
- EINECS号:250-218-7
- 分子式:C12H20分子量:164.2872
- 产品CID: 1290616
- 产品分类有机原料 → 脂质和类脂质分子 → 异戊烯醇脂质
物理性质
MSDS等安全信息
合成工艺路线路线简述
专利信息
专利号:US-6211345-B1
优先权日:1999-12-22
标 题:Synthesis of cyclic sulfur silanes
发明人：WELLER KEITH J; HWANG LESLEY
权利人:WITCO CORP
摘要:Sulfur-containing norbornanyl silanes are prepared in a simple, solventless manner by the reaction of a norbornenylsilane with sulfur in the presence of a chlorosilane. The resulting silanes may be used without further purification. The silanes were found to give good properties in rubber compositions for low-rolling-resistance tire applications.
专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.
专利号:US-8679724-B2
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
专利号:US-2008081290-A1
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
专利号:US-2007134588-A1
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
专利号:US-2014134541-A1
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
