CAS: 194999-85-4; Bis(4-(Tert-Butyl)Phenyl)Iodonium 1,1,2,2,3,3,4,4,4-Nonafluorobutane-1-Sulfonate

相似化合物

84563-54-2 197245-87-7 1204518-08-0

Potassium Nonaflate,Alkaline Earth Salt Of/the/ Methylsulfuric Acid 以 二氯甲烷,水 用作溶剂,化学反应 18.0H,反应生成二(4-叔丁基苯基)碘全氟代丁烷磺酸盐
参考文献:从电子激发态的[ir(cod)(μ-Me电子转移的驱动力依赖2 Pz)] 2到光-酸发生器
标题:从电子激发态的[ir(cod)(μ-Me电子转移的驱动力依赖2 Pz)] 2到光-酸发生器
摘要:我们报告的电子转移(et),电子被激发的反应物[ir(cod)(μ-Me中速率2 Pz)] 2与鎓盐光产酸剂(pag的).Pag的还原电位跨越一个大的电化学窗口,可以确定et反应的驱动力依赖性.Et的速率常数从电子激发的[ir(cod)(μ-Me 2 Pz)] 2至鎓pag在通过将反应驱动力,直到达到在乙腈中扩散极限来确定.
Doi:10.1021/acs.Jpca.7B07777

专利信息

专利号:US-2023294064-A1
优先权日:2015-12-28
标 题:Substrates, systems, and methods for nucleic acid array synthesis
发明人：RAJASEKARAN JOHN J
权利人:VIBRANT HOLDINGS LLC
摘要:Disclosed herein are formulations, substrates, and arrays for the synthesis of PNA chains and PNA-DNA chimera on microarrays. In some embodiments, the formulations include a photo-protective compound that shields any PNA monomers, PNA polymers, or PNA-DNA chimera already attached to a microarray from radiation exposure during the synthesis of the PNA or PNA-DNA chains. In some embodiments, substrates and arrays comprise a porous or a planar layer for synthesis and attachment of PNA or DNA monomers, or PNA or PNA-DNA polymers. In some embodiments, disclosed herein are formulations and methods for high efficiency coupling of PNA monomers or PNA polymers to a microarray substrate.

专利号:US-2021238374-A1
优先权日:2020-02-04
标 题 :Templated synthesis of nanovoided polymers
发明人：YE SHENG; LANDIG RENATE EVA KLEMENTINE; DIEST KENNETH ALEXANDER; OUDERKIRK ANDREW JOHN; BOWMAN CHARLES ROBERT; BOWMAN ROBERT G; HENDRICKSON WILLIAM ARTHUR; RUEB CHRISTOPHER J; PURVIS II LAFE JOSEPH; SUN WENMO; LI RYAN; YAROSHCHUK OLEG; RAO TINGLING; BOROMAND ARMAN; ZHAO CHURNING; Khaleghimeybodi Morteza
权利人:FACEBOOK TECH LLC
摘要:A method of forming a voided polymer includes forming a polymerizable composition containing a polymer precursor and a solid templating agent, forming a coating of the polymerizable composition, processing the coating to form a cured polymer material having a solid phase in a plurality of defined regions, and removing at least a portion of the solid phase from the cured polymer material to form a voided polymer layer.

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:EP-4100466-A1
优先权日:2020-02-04
标题 :Templated synthesis of nanovoided polymers

专利号:WO-2021158514-A1
优先权日:2020-02-04
标题:Templated synthesis of nanovoided polymers