CAS: 31480-93-0; 4-Hydroxyphenyl Methacrylate

上下游产品

4-乙酰氧基苯酚 Hydroquinone Monoacetate 3233-32-7

脱氧熊果苷置于盐酸,4-二甲氨基吡啶,N,N'-二异丙基碳二亚胺体系中,用 四氢呋喃,甲醇,二氯甲烷,水 用作溶剂,化学反应 13.0H,反应生成2-甲基-2-丙烯酸 4-羟基苯基酯
参考文献:重合性ケイ皮酸エステル誘導体の製造方法
标题:重合性ケイ皮酸エステル誘導体の製造方法
摘要:提供一种制造添加到液晶组分中并制造tft液晶显示元件的方法,以减少显示元件的烧结,该方法涉及制造一种聚合性硅皮酸酯衍生物.此外,还提供了制造含有该聚合性硅皮酸酯衍生物的聚合性组合物的方法,以及通过聚合该聚合性组合物获得液晶显示元件的制造方法.解决方案包括制备以下通式(i)所示的化合物和以下通式(II)所示的化合物反应的步骤,从而制备以下通式(III)所示的化合物.[选择图]无

专利信息

专利号:US-9703192-B2
优先权日:2012-09-15
标 题:Onium compounds and methods of synthesis thereof
发明人：LABEAUME PAUL J
权利人:ROHM & HAAS ELECT MAT
摘要:New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

专利号:US-2018052390-A1
优先权日:2012-09-15
标 题 :Onium compounds and methods of synthesis thereof

专利号:US-5206349-A
优先权日:1990-08-10
标题:Aromatic diazo compounds and photosensitive compositions using the same
发明人：IIDA HIROTADA; ARAI HAJIME; SUGIURA HITOSHI; SUGOU KATSUHIKO; HARADA KIEKO
权利人:TOYO GOSEI KOGY CO LTD
摘要:An aromatic diazo compound having at least two groups of Formula (I) in the molecule. n This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method. n The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z 1 indicates ##STR2## wherein φ 1 is arylene or substituted arylene; and -φ 2 is >Câ•?O, lower alkyl, lower alkylene, or aryl or substituted aryl. n R 1 and R 2 are H, alkyl of C 1 to C 8 , or alkyloxy of C 1 to C 8 ; X - is anion; and R 3 indicates alkyl, saturated alkyl, aralkyl, substituted aralkyl, or a group similar to ##STR3##

专利号:US-2014080056-A1
优先权日:2012-09-15
标题 :Onium compounds and methods of synthesis thereof

专利号:CN-114560768-B
优先权日:2022-03-09
标 题:A synthesis method of acrylate resin monomer for 193nm photoresist