CAS: 249562-06-9; 2-Methyladamantan-2-Yl Acrylate

相似化合物

177080-67-0 121601-93-2 297156-50-4

上下游产品

CAS号702-98-7 2-甲基-2-金刚烷醇 | CAS号814-68-6 丙烯酰氯 | CAS号875-72-9 2-亚甲基金刚烷 | CAS号79-10-7 丙烯酸

2-甲基-2-金刚烷醇,丙烯酰氯置于三乙胺体系中,用 四氢呋喃,乙醚 用作溶剂,以80%的收率获得2-甲基-2-金刚烷醇丙烯酸酯
参考文献:2-Alkyl-2-Adamantyl 5-Norbornene-2-Carboxylates And Method Of Producing The Same
标题:2-Alkyl-2-Adamantyl 5-Norbornene-2-Carboxylates And Method Of Producing The Same
摘要:提供了一种新型的莽环烯羧酸酯化合物及其制备方法.所述莽环烯羧酸酯化合物是由式(1)表示的2-烷基-2-金刚烷基-5-莽环烯-2-羧酸酯,其中r为甲基或乙基.

专利信息

专利号:US-7399806-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers
发明人：BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG
权利人:SYMYX TECHNOLOGIES INC
摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

专利号:US-2003235777-A1
优先权日:2001-12-31
标题 :Phenolic polymers, methods for synthesis thereof and photoresist compositions comprising same
发明人：GRONBECK DANA A; BARCLAY GEORGE G
权利人:SHIPLEY CO LLC
摘要:The invention provides phenolic polymers, and methods for synthesis and photoresists that comprise such polymers. Synthetic methods of the invention include providing a polymer that contains esterified meta-phenolic units, and removing the ester group preferably by hydrolysis to provide a polymer with meta-phenolic units.

专利号:US-7250475-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers

专利号:US-2007185276-A1
优先权日:2003-06-26
标 题:Synthesis of Photresist Polymers

专利号:KR-20090102733-A
优先权日:2006-12-27
标 题 :Method for synthesis of hyperbranched polymer, hyperbranched polymer, resist composition, semiconductor integrated circuit, and method for production of semiconductor integrated circuit

专利号:KR-20090103860-A
优先权日:2006-12-28
标题:Process for synthesis of hyperbranched polymer, hyperbranched polymer, resist compositions, semiconductor integrated circuits, and process for production of semiconductor integrated circuits