CAS: 624-16-8; 4-Decanone

相似化合物

2051-31-2 45206-91-5 540-08-9

上下游产品

CAS号2051-31-2 4-癸醇 | CAS号592-41-6 1-己烯 | CAS号6117-91-5 巴豆醇 | CAS号872-05-9 正癸烯 | CAS号504-63-2 1,3-丙二醇 | CAS号125443-84-7 3-hexyl-3-propy... | CAS号124-18-5 正癸烷 | CAS号111-14-8 庚酸 | CAS号2051-31-2 4-癸醇

📜4-正癸醇置于dioxo(Tetramesitylporphyrinato)Ruthenium(Vi) 一氧化二氮体系中,用 1,2-二氯乙烷 作为反应溶剂,150.0 °C,1.01 Mpa 条件下,反应 7.5H,以89%的收率获得产物4-癸酮
参考文献:使用钌络合物催化剂氧化仲醇和苄醇的一氧化二氮氧化
标题:使用钌络合物催化剂氧化仲醇和苄醇的一氧化二氮氧化
摘要:介绍了使用钌卟啉复合物催化 N2O 氧化各种仲醇和苄醇.仲醇和苄醇都被顺利消耗,以高产率得到相应的酮和醛.一氧化二氮 (N2O) 有望成为一种新的终端氧化剂,它仅产生双氮气体作为唯一的副产品,以减少浪费.
DOI:10.1246/cl.2001.922

专利信息

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

专利号:WO-2013067646-A1
优先权日:2011-11-12
标题:Process for the synthesis of beta-aminocarbonyls
发明人：BEAUCHEMIN ANDRE MARTIN; CLAVETTE CHRISTIAN; GAN WEI; MARKIEWICZ THOMAS; TODERIAN AMY BEVERLY
权利人:UNIV OTTAWA
摘要:The present application provides processes and intermediates useful in the production of β- aminocarbonyl- or β-aminothiocarbonyl-containing compounds. Provided herein is a process for synthesizing β-aminocarbonyl- or β-aminothiocarbonyl-containing compounds from an alkene and a hydrazone. Also provided herein is a process for synthesizing β-aminocarbonyl- or β-aminothiocarbonyl-containing compounds from an alkene and a hydrazine. The present application further provides intermediate aminoisocyanate and iminoisocyanate compounds, and methods for synthesizing the starting hydrazone and hydrazine compounds.

专利号:US-8653223-B2
优先权日:2008-04-16
标题:Transketalized compositions, synthesis, and applications
发明人：SELIFONOV SERGEY; GOETZ ADAM EDWARD; JING FENG
权利人:SELIFONOV SERGEY; GOETZ ADAM EDWARD; JING FENG; SEGETIS INC
摘要:Ketal compounds of the structure I n nand a method of preparation of the compound from polyols and oxocarboxylates, as well as uses thereof.

专利号:US-8679724-B2
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

专利号:US-2008081290-A1
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition