CAS: 266308-58-1; 1-Ethylcyclopentyl Methacrylate

相似化合物

178889-45-7 326925-69-3 1149760-04-2

环戊酮置于4-二甲氨基吡啶,吩噻嗪,Magnesium,三乙胺体系中,用 四氢呋喃,二氯甲烷 用作溶剂,化学反应 6.5H,反应生成1-乙基环戊基甲基丙烯酸酯
参考文献:一种酸敏感光刻胶树脂单体的制备方法
标题:一种酸敏感光刻胶树脂单体的制备方法
摘要:本发明涉及一种酸敏感光刻胶树脂单体的制备方法,所述制备方法包括如下合成路线:式中,M为c4~c7的环烷基,R1为c1~c6烷基,R2为氢原子或c1~c6烷基;所述制备方法包括如下合成步骤:C)将式ⅲ化合物,缚酸剂,催化剂和阻聚剂溶于第一有机溶剂中,滴加式ⅱ化合物,进行酯化反应,得到式ⅰ化合物;D)将步骤c)的反应液进行淬灭,酸洗,碱洗,浓缩和减压蒸馏.本发明的酸敏感光刻胶树脂单体的制备方法收率高,纯度高,尤其在百公斤级制备下仍然具有收率高和纯度高的有益效果.

专利信息

专利号:US-9703192-B2
优先权日:2012-09-15
标 题:Onium compounds and methods of synthesis thereof
发明人：LABEAUME PAUL J
权利人:ROHM & HAAS ELECT MAT
摘要:New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

专利号:US-7399806-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers
发明人：BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG
权利人:SYMYX TECHNOLOGIES INC
摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

专利号:US-7250475-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers

专利号:US-2008248418-A1
优先权日:2007-04-04
标 题:Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom

专利号:US-8304572-B2
优先权日:2007-04-04
标题:Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom
发明人：FARNHAM WILLIAM BROWN
权利人:FARNHAM WILLIAM BROWN; DU PONT
摘要:This invention relates to processes for preparing fluoroalcohol-substituted (meth)acrylate esters. This invention also relates to block copolymers incorporating repeat units derived from fluoroalcohol-substituted (meth)acrylate esters, and photoresists derived therefrom.

专利号:US-2007185276-A1
优先权日:2003-06-26
标 题:Synthesis of Photresist Polymers