专利号:US-9018387-B2 优先权日:2010-06-11 标 题:Complexes of imidazole ligands 发明人:NORMAN JOHN ANTHONY THOMAS; PEREZ MELANIE K; LEI XINJIAN; SPENCE DANIEL P; IVANOV SERGEI VLADIMIROVICH; BAILEY III WADE HAMPTON 权利人:NORMAN JOHN ANTHONY THOMAS; PEREZ MELANIE K; LEI XINJIAN; SPENCE DANIEL P; IVANOV SERGEI VLADIMIROVICH; BAILEY III WADE HAMPTON; AIR PROD & CHEM 摘要:Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated.
专利号:US-2006032836-A1 优先权日:2001-11-16 标 题 :Methods of controlling the properties of abrasive particles for use in chemical-mechanical polishing slurries 发明人:FENG XIANGDONG; HER YIE-SHEIN 权利人:FERRO CORP 摘要:The present invention provides methods of controlling the properties of abrasive particles produced via hydrothermal synthesis for use in chemical-mechanical polishing slurries. In accordance with the methods of the invention, variables such as cerium salt concentration, dopant solution concentration, hydrothermal medium pH, hydrothermal temperature and processing duration are controlled to produce particles having the desired properties and shapes. The abrasive particles formed in accordance with the method of the invention can be used to produce CMP slurries that provide substantial improvements in the polishing of STI structures and a reduction in defects.
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