专利号:US-6482898-B1 优先权日:1998-08-20 标题:Halogenated wang resins for combinatorial chemical synthesis 发明人:YOO SUNG EUN; GONG YOUNG DAE; SEO JIN SOO 权利人:KOREA RES INST CHEM TECH 摘要:The present invention relates to novel halogenated Wang resins for combinational chemical synthesis, more specifically to halogenated Wang resins expressed by formula (1) useful for the effective tracing of combinational chemical synthetic process on solid supports using X-ray photoelectron spectroscopy (XPS) element analysis method; in formula (1), P represents polystyrene-divinylbenzene; X and Y represent hydrogen atom or halogen atom, which may be identical or different, their total number being 1-4; and at least one of them is halogen atom.