CAS: 10137-69-6; 3-Cyclohexenyltrichlorosilane

上下游产品

trichlorovinylsilane buta-1,3-diene cyclohexa-1,4-diene cyclohexa-1,3-diene trichloro-(3,4-dichloro-cyclohexyl)-silane (3-cyclohexenyl)trimethylsilane 3-cyclohexenylsilane trichloro-cyclohexa-2,4-dienyl-silane

📜1,4-环己二烯置于四丁基氯化膦 三氯硅烷体系中,化学反应 4.0H,以72%的收率获得4,5-Bis(Trichlorosilyl)Cyclohexene
参考文献:Trichlorosilyl Groups Containing Organochlorosilanes And Their Preparation Methods By The Double-Silylation Of Olefins With Trichlorosilane
标题:Trichlorosilyl Groups Containing Organochlorosilanes And Their Preparation Methods By The Double-Silylation Of Olefins With Trichlorosilane
摘要:本发明提供了含有两个三氯硅基团的有机硅化合物及其制备方法.通过在四元有机磷盐存在下,将式i的线性链或环烯烃与三氯硅烷反应,可以制备出式ii的有机硅化合物.在式i和式ii中,R1和r2可以相同也可以不同,代表氢原子,线性或环状的c1-C8烷基,线性或环状的c1-C8烯基,苄基,苯基,一个c1-C8烷基取代的苯基团,R1和r2之间的两个功能基团可以共价键合形成一个c4-C8环,有或没有碳-碳双键.

专利信息

专利号:US-7319159-B1
优先权日:2006-09-13
标 题:Cyclohexadien-2,4-ylsilane and its derivatives, synthesis of the same, and the pyrolysis of the same to silane
发明人：SAULYS DOVAS A; KUECH THOMAS F; ROBERTS JOHN A
权利人:WISCONSIN ALUMNI RES FOUND
摘要:Silane gas precursor compounds having the formula (I): n nwherein R 1 , R 2 , and R 3 each can independently be hydrogen or halogen and wherein the cyclohexadiene ring can have one or more substituents selected from the group consisting of a saturated or unsaturated, straight chain or branched alkyl group, a halogen, NO 2 , and C≡N are disclosed. In one form, the silane gas precursor compound is cyclohexadien-2,4-ylsilane, an air-stable liquid, that can be thermolyzed in a pyrolysis process to efficiently generate high purity silane gas. The compounds of the present invention can thus serve as a “point-of-useâ€? precursor for silane gas.

专利号:US-6136926-A
优先权日:1996-07-22
标 题 :Cross-linkable, olefinic polymers and methods for their synthesis
发明人：RAETZSCH MANFRED; HESSE ACHIM; BUCKA HARMUT; LEISTNER DIRK; IVANCHEV SERGEJ; HEIKIN SAUL; MESH ALLA; PUKSCHANSKI MOISEJ
权利人:BOREALIS GMBH
摘要:Cross-linkable, olefinic polymers synthesized from mixtures of olefinic polymers and ethylenically unsaturated organosilane compounds, which can be grafted, by a 2-step method using thermally decomposing free radical-forming agents by heating the mixtures to a temperature of 30 DEG to 110 DEG C. below the softening temperature or the crystallite melting point of the olefinic polymers used and subsequently heating the mixtures to a reaction temperature of 10 DEG to 60 DEG C. below the softening temperature or the crystallite melting point of the olefinic polymers used. In the alternative, they can be grafted by a method involving the action of ionizing radiation with simultaneous absorption of organosilane compounds and the action of radiation. The method is suitable for producing films, sheets, fibers, panels, coatings, pipes, hollow objects, foamed materials and molded articles.