CAS: 3353-89-7; Triphenylsulfoniumbromide

📜溴苯置于magnesium,三甲基氯硅烷,亚硫酸二甲酯体系中,用 四氢呋喃 作为反应溶剂,以50%的收率获得产物三苯基溴化锍
参考文献:使用格氏试剂和三甲基氯硅烷作为活化剂制备三芳基溴化锍的简便方法
标题:使用格氏试剂和三甲基氯硅烷作为活化剂制备三芳基溴化锍的简便方法
摘要:三芳基溴化锍通过二芳基亚砜与芳基格氏试剂在 Tmsci 存在下反应合成,然后用 Hbr 水溶液处理.在tmsci存在下,用5当量格氏试剂处理亚硫酸二甲酯或亚硫酰氯,合成了硫原子上具有三个相同取代基的溴化三芳基锍.
DOI:10.1055/s-2004-829113

专利信息

专利号:US-4980492-A
优先权日:1988-02-05
标题 :Synthesis of triarylsulfonium salts
发明人：DEKTAR JOHN L; HACKER NIGEL P
权利人:IBM
摘要:A triarylsulfonium salt is prepared in high yield and high purity by a two-step process involving a aryl Grignard reagent reacted with a diarylsulfoxide in a solvent which is a mixture of aliphatic and aromatic hydrocarbons, followed by a second step which is metathesis with ZMF 6 , where Z is a metal or metal-like anion, and M is antimony, arsenic or phosphorus, preferably employing an ammonium salt and carried out in a non-aqueous solvent.

专利号:US-9255079-B2
优先权日:2009-12-10
标 题 :Photoacid generators and photoresists comprising same
发明人：LI MINGQI; AQAD EMAD; LIU CONG; MATTIA JOSEPH; XU CHENG-BAI; BARCLAY GEORGE G
权利人:LI MINGQI; AQAD EMAD; LIU CONG; MATTIA JOSEPH; XU CHENG-BAI; BARCLAY GEORGE G; ROHM & HAAS ELECT MAT
摘要:New methods are provided for synthesis of photoacid generator compounds (“PAGsâ€?), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, sulfonium-containing (S+) photoacid generators and methods of synthesis of sulfonium photoacid generators are provided.

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:US-9348220-B2
优先权日:2010-03-31
标 题 :Photoacid generators and photoresists comprising same
发明人：AQAD EMAD; LI MINGQI; XU CHENG-BAI; LIU CONG
权利人:AQAD EMAD; LI MINGQI; XU CHENG-BAI; LIU CONG; ROHM & HAAS ELECT MAT
摘要:New methods are provided for synthesis of photoacid generator compounds (“PAGsâ€?), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds. In a particular aspect, photoacid generators that comprise 1) a SO 3 − moiety; 2) one or more fluorinated carbons; and 3) one or more of the fluorinated carbons either directly or indirectly substituted by an ester keto group.

专利号:EP-0327194-B1
优先权日:1988-02-05
标 题:Synthesis of triarylsulphonium salts

专利号:EP-0327194-A1
优先权日:1988-02-05
标 题 :Synthesis of triarylsulphonium salts