CAS: 18279-67-9; 2-Chloroethyltriethoxysilane

上下游产品

ethanol trichloro(2-chloroethyl)silane (3-aminopropyl)triethoxysilane diethyl [2-(triethoxysilyl)ethyl]phosphonate

📜2-氯乙基三氯硅烷置于c2H5Oh体系中,用 乙醇 用作溶剂,以33%的收率获得2-氯乙基三乙氧基硅烷
参考文献:Studies In Silico-Organic Compounds. Xiv. Alkoxyl Derivatives Of The Isomeric Chloroethyltrichlorosilanes
标题:Studies In Silico-Organic Compounds. Xiv. Alkoxyl Derivatives Of The Isomeric Chloroethyltrichlorosilanes
摘要:
Doi:10.1021/jo01143A006

专利信息

专利号:US-9834536-B2
优先权日:2013-04-23
标题:Method for producing catalyst for cyclic carbonate synthesis
发明人：TAKAHASHI TOSHIKAZU; YASUDA HIROYUKI; SAKAKURA TOSHIYASU; YAMAMOTO SHOUJI; NANIKI TAKASHI; FURUKAWA TAKURO
权利人:AIST; MARUZEN PETROCHEM CO LTD
摘要:A method for producing a heterogeneous catalyst for use of synthesizing cyclic carbonates by reacting an epoxide and carbon dioxide in the presence of the catalyst. A method for making a catalyst that includes forming a catalyst precursor then reacting the catalyst precursor with a tertiary phosphine.

专利号:US-10029241-B2
优先权日:2013-04-23
标题:Method for producing catalyst for cyclic carbonate synthesis
发明人：NANIKI TAKASHI; TAKAHASHI TOSHIKAZU; YASUDA HIROYUKI; YAMAMOTO SHOUJI
权利人:MARUZEN PETROCHEM CO LTD; AIST
摘要:A method for easily producing a heterogeneous catalyst having excellent catalytic activity at a low cost is provided. The heterogeneous catalyst is used for the purpose of synthesizing a cyclic carbonate by reacting an epoxide and carbon dioxide. A catalyst obtained by this production method and a method for synthesizing a cyclic carbonate with use of this catalyst are also provided.

专利号:US-8889334-B2
优先权日:2001-11-15
标题:Spin-on anti-reflective coatings for photolithography
发明人：KENNEDY JOSEPH T; BALDWIN-HENDRICKS TERESA
权利人:HONEYWELL INT INC
摘要:Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

专利号:US-7678462-B2
优先权日:1999-06-10
标 题:Spin-on-glass anti-reflective coatings for photolithography
发明人：KENNEDY JOSEPH; BALDWIN TERESA; HACKER NIGEL P; SPEAR RICHARD
权利人:HONEYWELL INT INC
摘要:Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.

专利号:CN-101559385-A
优先权日:2009-05-26
标 题:Immobilized ionic liquid Cu salt catalyst and its preparation method and application in the synthesis of dimethyl carbonate

专利号:CN-105121013-A
优先权日:2013-04-23
标 题:Method for producing catalyst for synthesis of cyclic carbonate