CAS: 649735-63-7; (R)-(S)-1-((4-((4-Fluoro-2-Methyl-1H-Indol-5-yl)Oxy)-5-Methylpyrrolo[2,1-F][1,2,4]Triazin-6-yl)Oxy)Propan-2-Yl 2-Aminopropanoate

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CAS号649736-41-4 (R)-1-((4-((4-f...

📜在 4-二甲氨基吡啶,5%-Palladium/activated Carbon,氢气,Sodium Methylate,盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺体系中,用 四氢呋喃,甲醇,水,N,N-二甲基甲酰胺,乙腈 作为反应溶剂,-1.0~30.0 °C,308.18 Kpa 条件下,反应 34.0H,反应生成 布立尼布丙氨酸酯
参考文献:新型吡咯并三嗪vegfr / Fgfr抑制剂brivanib Alaninate生产的控制策略
标题:新型吡咯并三嗪vegfr / Fgfr抑制剂brivanib Alaninate生产的控制策略
摘要:该手稿描述了商业化生产brivanib丙氨酸盐的控制策略.活性药物成分是易于水解的前药.除了控制水解之外,还需要一种鲁棒的策略来控制输入和过程相关的杂质.控制的三个重要方面包括:理解反应参数以使在与(R)-环氧丙烷的烷基化过程中的区域异构体最小化;通过统计模型开发设计空间以控制杂质的形成;以及使用原位ft-Ir监测cbz保护基的氢解反应.
DOI:10.1021/op500126U

专利信息

专利号:US-10793557-B2
优先权日:2018-04-03
标题 :Sting agonist compounds
发明人：ALTMAN MICHAEL D; CASH BRANDON D; CHILDERS MATTHEW LLOYD; CUMMING JARED N; DEMONG DUANE E; HAIDLE ANDREW MARC; HENDERSON TIMOTHY J; JEWELL JAMES P; LARSEN MATTHEW A; LIM JONGWON; LU MIN; OTTE RYAN D; TROTTER BENJAMIN WESLEY
权利人:MERCK SHARP & DOHME
摘要:Compounds of general formula (I), of general formula (II), of general formula (III), of general formula (IV), of general formula (V), of general formula (VI), and their pharmaceutically acceptable salts, wherein all variables are defined herein, that may be useful as inductors of type I interferon production, specifically as STING active agents, are provided. Also provided are compositions comprising such compounds, processes for the synthesis of such compounds, and to uses of such compounds, including administration of such compounds to induce immune response, to induce STING-dependent type I interferon production, and/or to treat a cell proliferation disorder, such as cancer.

专利号:US-2024400861-A1
优先权日:2021-10-01
标题 :Triazole- And/Or Triazolium-Based Polymers And Copolymers As Additives For Chemical Mechanical Planarization Slurries
发明人：LARBIG GREGOR; KIRSCH PEER; HENGST MATTHIAS; SHI XIAOBO; STENDER MATTHIAS
权利人:VERSUM MAT US LLC
摘要:Synthesis of triazole- and/or triazolium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising triazole- and/or triazolium-based polymers; and water. The use of the synthesized triazole- and/or triazolium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

专利号:US-11702430-B2
优先权日:2018-04-03
标 题:Aza-benzothiophene compounds as STING agonists
发明人：ALTMAN MICHAEL D; CASH BRANDON D; CUMMING JARED N; DEMONG DUANE E; HAIDLE ANDREW M; JEWELL JAMES P; LARSEN MATTHEW A; LU MIN; OTTE RYAN D; TAOKA BRANDON M; TROTTER BENJAMIN WESLEY; TRUONG QUANG T
权利人:MERCK SHARP & DOHME LLC; ALTMAN MICHAEL D; CASH BRANDON D; CUMMING JARED N; DEMONG DUANE E; HAIDLE ANDREW M; JEWELL JAMES P; LARSEN MATTHEW A; LU MIN; OTTE RYAN D; TAOKA BRANDON M; TROTTER BENJAMIN WESLEY; TRUONG QUANG T
摘要:Compounds of general formula (I), and their pharmaceutically acceptable salts, wherein R 1 , R 2 , R 3 , R 5 , R 6 , R 8 , R 9 , A, X 1 , X 2 , and X 3 are defined herein, that may be useful as inductors of type I interferon production, specifically as STING active agents, are provided. Also provided are compositions comprising such compounds, processes for the synthesis of such compounds, and to uses of such compounds, including administration of such compounds to induce immune response, to induce STING-dependent type I interferon production, and/or to treat a cell proliferation disorder, such as cancer.

专利号:WO-2024073211-A1
优先权日:2022-09-29
标题:Guanidinium-based polyionic liquids and their use as additives for chemical mechanical planarization slurries
发明人：LARBIG GREGOR; KIRSCH PEER; SHI XIAOBO
权利人:VERSUM MAT US LLC
摘要:Synthesis of guanidinium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising guanidinium-based polymers; and water. The use of the synthesized guanidinium-based polymers in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

专利号:US-2025215130-A1
优先权日:2022-04-11
标 题:Polycationic Polymer Or Copolymer Having Different Cation Types For Slurries In Chemical Mechanical Planarization
发明人：LARBIG GREGOR; SHI XIAOBO
权利人:MERCK PATENT GMBH; VERSUM MAT US LLC
摘要:Synthesis of polycationic polymer or copolymer is disclosed. The polycationic polymer or copolymer are formed by at least one first cationic monomer and at least one second cationic monomer wherein the first cationic monomer and the second cationic monomer have different cationic groups; such as imidazolium group and non-imidazolium group. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising polycationic polymer or copolymer; and water are also disclosed. The use of the synthesized polycationic polymer or copolymer in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.

专利号:WO-2024073209-A1
优先权日:2022-09-30
标 题 :Modified water-soluble polysaccharides having different cation types for slurries in chemical mechanical planarization
发明人：DAVIDI INBAL; LARBIG GREGOR; SHI XIAOBO; MA SANA
权利人:VERSUM MAT US LLC
摘要:Synthesis of cationic-modified water-soluble polysaccharide is disclosed. The cation is pendent to the polysaccharide backbone. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising cationic-modified water-soluble polysaccharide; and water. The use of the synthesized cationic-modified water-soluble polysaccharide in the CMP slurries reduces dishing and erosion in highly selective tungsten slurries.