CAS: 144317-44-2; Triphenylsulfonium Perfluoro-1-Butanesufonate

相似化合物

66003-78-9 81416-37-7 258872-05-8

二苯基亚砜置于三甲基氯硅烷体系中,用 甲醇,二氯甲烷,水 用作溶剂,化学反应 19.0H,反应生成全氟丁基磺酸三苯基锍盐
参考文献:一种arf光源干法光刻用多鎓盐型光产酸剂的制备方法
标题:一种arf光源干法光刻用多鎓盐型光产酸剂的制备方法
摘要:本发明公开了一种arf光源干法光刻用多鎓盐型光产酸剂的制备方法.该制备方法制备得到的鎓盐具有阴离子和鎓离子,所述阴离子具有式(I)所示的结构,所述鎓离子具有式(A)或式(B)所示的结构,所述鎓离子的个数使所述鎓盐的电荷保持中性.包含本发明制备方法制备得到的鎓盐的光刻胶具有更好的分辨率,灵敏度和线宽粗糙度.

专利信息

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:US-8053165-B2
优先权日:2008-03-18
标 题:Hydroxyl-containing monomer, polymer, resist composition, and patterning process
发明人：KINSHO TAKESHI; OHASHI MASAKI; HASEGAWA KOJI; WATANABE TAKERU
权利人:SHINETSU CHEMICAL CO
摘要:A hydroxyl-containing monomer of formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are monovalent C 1 -C 15 hydrocarbon groups, or R 2 and R 3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.

专利号:US-9802968-B2
优先权日:2010-02-19
标题 :Branched siloxanes and methods for synthesis
发明人：WILLSON C GRANT; OGAWA TSUYOSHI; JACOBSSON MICHAEL B
权利人:UNIV TEXAS
摘要:The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithogaphy, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.

专利号:CN-113200858-A
优先权日:2020-01-16
标题 :Synthesis of Monomolecular Resin Based on Triptene Derivatives, Positive Photoresist and Its Application in Photolithography

专利号:CN-113200858-B
优先权日:2020-01-16
标 题 :Synthesis based on triptycene derivative monomolecular resin, positive photoresist and application of positive photoresist in photoetching