CAS: 6074-84-6; Tantalum(V) Ethoxide (Metals Basis), Nb

该化合物是有机金属化合物,由钽组成,是一种过渡金属,结为三氧化二氮组,一般是淡黄色液体的无色,以其反应性而闻名,特别是水分,可导致水解和形成钽氧化物,这种化合物经常用于生产钽材料和薄膜,特别是在半导体工业中,因为它能够形成高质量的电介层. 敌旦乙氧还具有相对高的沸点和低挥发性的特点,使之适合各种化学过程.此外,必须谨慎地处理这种物质,因为接触皮肤或吸入时可能会有危险. 适当的安全措施,包括使用个人防护设备和在通风良好的地区工作,在实验室或工业环境中处理钽乙氧时,包括使用个人防护设备和在通风良好的地区工作,是至关重要的.

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CAS号7721-01-9 五氯化钽

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    专利信息


    专利号:US-2022228295-A1
    优先权日:2020-09-30
    标 题 :Synthesis of Refractory Transition Metal-Carbide Fibers
    发明人:Treadwell LaRico Juan; NICHOLAS JAMES; BELL NELSON S
    权利人:NAT TECH & ENG SOLUTIONS SANDIA LLC
    摘要:Refractory transition metal-carbide (RTM-C) fibers were synthesized via the Forcespinningâ„¢ method. This method allows for simple and rapid synthesis of these RTM-C fibers with the ability to make grams of fibers quickly.

    专利号:US-2017246619-A1
    优先权日:2014-09-26
    标 题 :Solid state synthesis of oxidative dehydrogenation catalysts
    发明人:BASSET JEAN-MARIE; ZHU HAIBO; ROSENFELD DEVON C; LAVEILLE PACO
    权利人:DOW GLOBAL TECHNOLOGIES LLC
    摘要:Synthesize a nickel oxide-based oxidative dehydrogenation catalyst via a solvent-free process that comprises sequential steps a. mixing without added solvent a combination of a solid nickel precursor, a solid oxalate or oxalic acid and, optionally, a doping amount of a metal precursor for a period of time sufficient to convert the combination to a visually homogenous mixture; and b. calcining the visually homogeneous mixture at a temperature within a range of from greater than 250° C. to less than 800° C. for a time within a range of from 30 minutes to 360 minutes in an oxygen-containing atmosphere, preferably air, to form a calcined oxidative dehydrogenation catalyst. As a modification of the process, add an intermediate step between steps a. and b. to dry the homo geneous mixture at a temperature within a range of from 50° C. to 90° C. for a period of time within a range of from 10 minutes to 600 minutes to form a dried mixture. The resulting catalyst may be used in oxidative dehydrogenation of ethane.

    专利号:US-2015158904-A1
    优先权日:2013-12-05
    标题 :Synthesis of tantalum sol-gel and production method of microextraction syringe for the purpose of enrichment of phosphopeptides
    发明人:SALIH BEKIR; CELIKBICAK OMUR; ATAKAY MEHMET
    权利人:SALIH BEKIR; CELIKBICAK OMUR; ATAKAY MEHMET
    摘要:The present invention relates to a production method of sol-gel ( 100 ) comprising tantalum metal and a method ( 200 ) concerning use of the sol-gel produced for enrichment of phosphopeptides by means of a microextraction syringe. The syringe which is filled with the sol-gel comprising tantalum metal enables to make analysis of natural samples, that comprise low amount of phosphoprotein, with high precision and in a very short time and it shows compliance with mass spectrometric techniques. Thus, it can be used for application of fast and practical analytical methods for the analysis made in phosphoproteomics studies wherein mass spectrometric techniques are used.

    专利号:US-2014271446-A1
    优先权日:2011-11-07
    标 题:Catalyst for direct synthesis of hydrogen peroxide
    发明人:DESMEDT FRÉDÉRIQUE J; GANHY JEAN-PIERRE; VLASSELAER YVES; MIQUEL PIERRE
    权利人:SOLVAY
    摘要:A catalyst comprising: a platinum group metal, silver or gold, and a carrier containing niobium or tantalum oxide or niobium or tantalum phosphate, and an oxide other than niobium or tantalum oxide, as well as its use in production of hydrogen peroxide. A process for producing hydrogen peroxide, comprising reacting hydrogen and oxygen in the presence of such catalyst in a reactor, and a process for producing such catalyst.

    专利号:US-8025932-B2
    优先权日:2007-02-21
    标 题 :Self-limiting thin film synthesis achieved by pulsed plasma-enhanced chemical vapor deposition
    发明人:WOLDEN COLIN; SEMAN MICHAEL T
    权利人:COLORADO SCHOOL OF MINES
    摘要:Ta 2 O 5 and Al 2 O 3 thin films were fabricated by pulsed plasma-enhanced chemical vapor deposition (PECVD) with simultaneous delivery of O 2 and the metal precursor. By appropriately controlling the gas-phase environment self-limiting deposition at controllable rates (Ëœ1 â„«/pulse) was obtained. The process was insensitive to substrate temperature, with a constant deposition rate observed from 90-350° C. As-deposited Ta 2 O 5 films under these conditions displayed good dielectric properties. Performance improvements correlate strongly with film density and composition as measured by spectroscopic ellipsometry and Fourier transform infrared spectroscopy. Pulsed PECVD eliminates the need for gas actuation and inert purge steps required by atomic layer deposition.

    专利号:US-6395350-B1
    优先权日:1997-10-29
    标题 :Mesoporous transition metal oxide thin films and methods of making and uses thereof
    发明人:BALKUS KENNETH J JR; KINSEL MARY E
    权利人:UNIV TEXAS
    摘要:Mesoporous transition metal oxide thin films and methods for producing these films are provided. Also provided are methods of fabricating useful chemical sensors and electrochromic devices from the thin films of the invention. Certain mesoporous transition metal oxide molecular sieves may be used as targets for pulsed laser ablation under controlled atmosphere, resulting in deposition of a thin film of the target material upon a substrate of choice. The thin films possess a mesoporous structure which may be enhanced by means of a hydrothermal treatment. The thin films also may be treated with a means of removing the templating agent used during synthesis of the mesoporous target material.
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    合成参考文献


    参考文献:10.1007/bf00638452
    摘要:Roth RS, Wadsley AD, Gatehouse BM. Composition of the phases in the systems NbO2−Nb2O5 and TiO2−Nb2O5. The Science of Nature. 1964 Jan;51(11):262–3. doi: 10.1007/bf00638452.
    参考文献:10.1007/bf00638453
    摘要:Imam SA, Rao BR. Structure of tantalum monoethoxide tetra tertiary butoxide. The Science of Nature. 1964 Jan;51(11):263. doi: 10.1007/bf00638453.
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