CAS: 227199-92-0; Triphenylsulfonium 10-Camphorsulfonate

相似化合物

3144-16-9 35963-20-3 5872-08-2

Triphenylsulfonium Iodide,Ethyl Ortho-Acetate,混旋樟脑磺酸,,氨置于二氯甲烷,乙醚体系中,用 二氯甲烷 用作溶剂,化学反应 12.0H,反应生成三苯基硫鎓樟脑磺酸盐
参考文献:Process For Producing Onium Salt Derivative And Novel Onium Salt Derivative
标题:Process For Producing Onium Salt Derivative And Novel Onium Salt Derivative
摘要:该发明提供了一种高产率的方法,用于生产有用于化学放大感光胶中的试剂,例如酸发生剂的离子盐衍生物,并提供新型离子盐衍生物.将含有卤化物阴离子或羧酸盐阴离子的离子盐衍生物与磺酸酯衍生物或磷酸衍生物反应,可高产率地得到离子硫酸盐衍生物或离子磷酸盐衍生物.

专利信息

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:US-8053165-B2
优先权日:2008-03-18
标 题:Hydroxyl-containing monomer, polymer, resist composition, and patterning process
发明人：KINSHO TAKESHI; OHASHI MASAKI; HASEGAWA KOJI; WATANABE TAKERU
权利人:SHINETSU CHEMICAL CO
摘要:A hydroxyl-containing monomer of formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are monovalent C 1 -C 15 hydrocarbon groups, or R 2 and R 3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.