CAS: 13709-47-2; Scandium(Iii) Fluoride

该化合物是一种无机化合物,其特点是高热稳定性和化学惰性,在立体结构中结晶,具有低热膨胀和高熔点等显著特性(~1,552°C). ScF3主要用于固态化学和材料科学,作为含有扫描材料(包括合金和光学涂层)的前体,其氟化特性使其在专门化学合成中具有价值.该化合物还因其负热膨胀行为进行了研究,这有可能应用于精确光学和电子学.ScF3由于具有湿度和强酸或基的再活动,通常在受控制的条件下处理.

结构式图片

欧盟法规

ECHA物质ECHA物质C&L通报REACH预注册

上下游产品

CAS号84963-91-7

合成工艺路线路线简述

    📜氢化钪置于fluoroplast-4体系中,用 Neat (No Solvent) 用作溶剂,化学反应生成三氟化钪
    参考文献:Batsanov,S. S.; Kopaneva,L. I.; Lazareva,E. V.,Russian Journal Of Inorganic Chemistry,1983,Vol. 28,P. 603-604
    标题:Batsanov,S. S.; Kopaneva,L. I.; Lazareva,E. V.,Russian Journal Of Inorganic Chemistry,1983,Vol. 28,P. 603-604

    专利信息


    专利号:FR-2709747-A1
    优先权日:1993-09-06
    标题:Process for the synthesis of anhydrous fluorides and process for the synthesis of fluorinated glass.

    专利号:US-2024327300-A1
    优先权日:2023-03-29
    标 题 :Ceramic synthesis through surface coating of powders
    发明人:DEEPAK NITIN; WOO KATHERINE; SHEIL RYAN; ROCHA-ALVAREZ JUAN CARLOS; SUN JENNIFER Y
    权利人:APPLIED MATERIALS INC
    摘要:Exemplary processing methods may include providing a powder to a processing region of a processing chamber. The methods may include providing one or more deposition precursors to the processing region. The methods may include generating plasma effluents of the one or more deposition precursors. The methods may include depositing a layer of material on the powder in the processing region. The layer of material may include a corrosion-resistant material. A temperature within the processing chamber is maintained at less than or about 700° C.

    供应商参考报价(招募中)

    品牌试剂参考报价(招募中)

    📌 第三方产品分析报告

    ✅ COA系统入驻 | 共享模式

    合成参考文献


    摘要:Gigiena Truda i Professional'nye Zabolevaniya. Labor Hygiene and Occupational Diseases., 35(8)(43), 1991
    📝 需求与反馈
    尽可能描述清楚需求与问题信息
    ×

    通知