
专利信息
专利号:CN-116790920-B
优先权日:2022-10-11
标 题 :A melt quenching method for general synthesis of nanoporous metal compound materials doped with metal single atoms
专利号:CN-116790920-A
优先权日:2022-10-11
标题:Universal synthesis of single-atom doped nano porous metal compound material by melt quenching method
专利号:WO-2025060689-A1
优先权日:2023-09-22
标题:Indium phosphide crystal containing doped element, single crystal wafer, preparation method therefor and device
发明人:XIAO YADONG; ZHANG SHUHUI; SHI NING
权利人:BEIJING TONGMEI XTAL TECH CO LTD; CHAO YANG TONGMEI XTAL TECH CO LTD
摘要:The present invention relates to an indium phosphide crystal containing a doped element, a single crystal wafer and a preparation method therefor. Specifically, the invention relates to an indium phosphide crystal containing a doped element, the doped element being doped in an indium phosphide crystal growth melt or in an indium phosphide polycrystalline material synthesis, and the indium phosphide crystal being an S-doped or Sn-doped N-type indium phosphide single crystal, or a Zn-doped P-type indium phosphide single crystal; the doped element is one or more elements, and the segregation coefficient thereof in indium phosphide is not greater than 0.05; the content of the doped element in the indium phosphide crystal is 30 ppb to 30 ppm. The present invention also relates to a method for preparing an indium phosphide crystal containing a doped element, a method for preparing a single crystal wafer, and a device prepared using the indium phosphide single crystal. The indium phosphide single crystal obtained thereby has a high yield rate.