CAS: 209982-56-9; 2-Ethyl-2-Adamantyl Methacrylate

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CAS号74-96-4 溴乙烷 | CAS号700-58-3 2-金刚烷酮 | CAS号80-62-6 甲基丙烯酸甲酯 | CAS号92-84-2 吩噻嗪 | CAS号920-46-7 甲基丙烯酰氯 | CAS号79-41-4 甲基丙烯酸 | CAS号7664-93-9 硫酸 | CAS号13376-16-4 2-ethylideneada... | CAS号702-98-7 2-甲基-2-金刚烷醇 | CAS号281-23-2 金刚烷

甲基丙烯酸乙烯酯,2-乙基-2-金刚烷醇置于四氯苯醌体系中,用 正己烷 用作溶剂,化学反应 6.0H,以93.45%的收率获得2-乙基-2-金刚烷基甲基丙烯酸酯
参考文献:一种193Nm光刻胶用丙烯酸酯树脂单体的合成方法
标题:一种193Nm光刻胶用丙烯酸酯树脂单体的合成方法
摘要:本发明涉及一种193Nm光刻胶用丙烯酸酯树脂单体的合成方法,以丙烯酸乙烯酯或甲基丙烯酸乙烯酯以及醇为反应原料,以小极性的烷烃溶剂为反应溶剂,加入阻聚剂,用碱性的离子交换树脂作为催化剂,在低温条件下通过酯交换得到丙烯酸酯.本发明提出了的193Nm光刻胶用丙烯酸酯树脂单体的合成方法,反应过程操作简单,反应高效,安全,是一条可以适用于工业化生产的工艺路线.

专利信息

专利号:US-9703192-B2
优先权日:2012-09-15
标 题:Onium compounds and methods of synthesis thereof
发明人：LABEAUME PAUL J
权利人:ROHM & HAAS ELECT MAT
摘要:New onium salt compounds and methods for synthesis of such compounds are provided. Preferred methods of the invention include (a) providing an onium salt compound comprising a sulfonate component having an electron withdrawing group; and (b) treating the onium salt compound with a halide salt to form a distinct salt of the onium compound. The present onium compounds are useful as an acid generator component of a photoresist composition.

专利号:US-7399806-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers
发明人：BENOIT DIDIER; SAFIR ADAM; CHANG HAN-TING; CHARMOT DOMINIQUE; OKAMOTO KENJI; NISHIMURA ISAO; WANG YONG
权利人:SYMYX TECHNOLOGIES INC
摘要:The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

专利号:US-7250475-B2
优先权日:2003-06-26
标 题:Synthesis of photoresist polymers

专利号:US-8043786-B2
优先权日:2003-03-05
标题 :Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
发明人：EBATA SATOSHI; WANG YONG; NISHIMURA ISAO
权利人:JSR CORP
摘要:The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), n nwherein R 1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R 2 to R 4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

专利号:US-2007185276-A1
优先权日:2003-06-26
标 题:Synthesis of Photresist Polymers

专利号:KR-20090102733-A
优先权日:2006-12-27
标 题 :Method for synthesis of hyperbranched polymer, hyperbranched polymer, resist composition, semiconductor integrated circuit, and method for production of semiconductor integrated circuit