专利号:US-9828674-B2 优先权日:2009-10-26 标题 :Synthesis and use of precursors for ALD of group VA element containing thin films 发明人:PORE VILJAMI; HATANPÄÄ TIMO; RITALA MIKKO; LESKELÄ MARKKU 权利人:ASM IP HOLDING BV 摘要:Atomic layer deposition (ALD) processes for forming Group VA element containing thin films, such as Sb, Sb—Te, Ge—Sb and Ge—Sb—Te thin films are provided, along with related compositions and structures. Sb precursors of the formula Sb(SiR 1 R 2 R 3 ) 3 are preferably used, wherein R 1 , R 2 , and R 3 are alkyl groups. As, Bi and P precursors are also described. Methods are also provided for synthesizing these Sb precursors. Methods are also provided for using the Sb thin films in phase change memory devices.
专利号:US-3454610-A 优先权日:1966-05-26 标 题 :Synthesis of organometallic halides by redistribution 发明人:LANGER HORST G 权利人:DOW CHEMICAL CO
专利号:US-11542600-B2 优先权日:2009-10-26 标题 :Synthesis and use of precursors for ALD of group VA element containing thin films
专利号:US-12043893-B2 优先权日:2017-08-24 标题:Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof 发明人:KING DAVID; DAMERON ARRELAINE; TREVEY JAMES; LICHTY PAUL; ARGO ANDREW; BOURGOIS KYLE; RAGONESI JAMES; INGHAM KYLE; JACKSON DAVID; TRACY RYON; NGUYEN NGHI; LYON ADAM; VILLAGOMEZ JOSE; CURRY GARRETT 权利人:FORGE NANO INC 摘要:A system, apparatus and method are provided for processing articles. The system includes subsystems for synthesizing, pre-treating, conducting a vapor phase coating process and post-treating articles in the form of powders and solid or porous workpieces. The apparatus permits vapor phase synthesis, treatment and deposition processes to be performed with high efficiency and at high overall throughput. The methods include converting solids, liquids or gases into gaseous and solid streams that can be separated or exchanged with or without treatment and/or coating steps, and produce optimized composite articles for specific applications.
专利号:US-2012329208-A1 优先权日:2009-10-26 标题:Synthesis and use of precursors for ald of group va element containing thin films
专利号:TW-I516632-B 优先权日:2009-10-26 标 题 :Synthesis and use of precursors for atomic layer deposition of films containing VA elements
摘要:Isovitsch, R., Science of Synthesis Knowledge Updates, (2021) 2, 253. 摘要:Schafer, E. W., Jr., and W. A. Bowles Jr. 1985. Acute oral toxicity and repellency of 933 chemicals to house and deer mice. Archives of Environmental Contamination and Toxicology 14:111-129. https://www.aphis.usda.gov/ws/nwrc/chem-effects-db/S_schafer851.pdf