专利号:US-5206349-A 优先权日:1990-08-10 标题:Aromatic diazo compounds and photosensitive compositions using the same 发明人:IIDA HIROTADA; ARAI HAJIME; SUGIURA HITOSHI; SUGOU KATSUHIKO; HARADA KIEKO 权利人:TOYO GOSEI KOGY CO LTD 摘要:An aromatic diazo compound having at least two groups of Formula (I) in the molecule. n This aromatic diazo compound can be handled under visible light free from ultraviolet, is high in photosensitivity, and can be produced by a simple synthesis method. n The diazo compound has a high solubility in organic solvents, appropriate for use as a photosensitive material for a lithographic printing plate, can be easily developed by an alkaline developing solution mainly based on an alkaline aqueous solution, and has a water solubility appropriate for use in a screen printing plate. ##STR1## wherein Z 1 indicates ##STR2## wherein φ 1 is arylene or substituted arylene; and -φ 2 is >Câ•?O, lower alkyl, lower alkylene, or aryl or substituted aryl. n R 1 and R 2 are H, alkyl of C 1 to C 8 , or alkyloxy of C 1 to C 8 ; X - is anion; and R 3 indicates alkyl, saturated alkyl, aralkyl, substituted aralkyl, or a group similar to ##STR3##
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