CAS: 16809-88-4; Methacrylicacidcalciumsalt

专利信息

专利号:US-6869983-B2
优先权日:2003-06-10
标题:Spatially controlled, in situ synthesis of polymers
发明人：CANEBA GERARD T; TIRUMALA VIJAYA RAGHAVAN; MANCINI DERRICK C; WANG HSIEN-HAU
权利人:UNIV CHICAGO
摘要:An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.

专利号:US-2005043428-A1
优先权日:2003-06-10
标题:Spatially controlled, in situ synthesis of polymers