CAS: 13450-95-8; Germanium(Iv) Iodide

上下游产品

germanium iodine methyl iodide ethyl iodideantimony triiodide germaniumtetrachloride antimony(III) chloride germanium

📜以 Solid 用作溶剂,化学反应生成四碘化锗
参考文献:双(二甲基锗烷基)烷烃-四羰基铁:合成,光解和反应性
标题:双(二甲基锗烷基)烷烃-四羰基铁:合成,光解和反应性
摘要:
Doi:10.1021/om00109A001

专利信息

专利号:US-7615169-B2
优先权日:2004-09-20
标题 :Method for synthesis of colloidal nanoparticles
发明人：STROUSE GEOFFREY FIELDING; GERBEC JEFFREY A; MAGANA DONNY
权利人:UNIV CALIFORNIA
摘要:A method for synthesis of high quality colloidal nanoparticles using comprises a high heating rate process. Irradiation of single mode, high power, microwave is a particularly well suited technique to realize high quality semiconductor nanoparticles. The use of microwave radiation effectively automates the synthesis, and more importantly, permits the use of a continuous flow microwave reactor for commercial preparation of the high quality colloidal nanoparticles.

专利号:US-7927516-B2
优先权日:2004-09-20
标题 :Method for synthesis of colloidal nanoparticles
发明人：STROUSE GEOFFREY F; GERBEC JEFFREY A; MAGANA DONNY
权利人:UNIV CALIFORNIA
摘要:A method for synthesis of high quality colloidal nanoparticles using comprises a high heating rate process. Irradiation of single mode, high power, microwave is a particularly well suited technique to realize high quality semiconductor nanoparticles. The use of microwave radiation effectively automates the synthesis, and more importantly, permits the use of a continuous flow microwave reactor for commercial preparation of the high quality colloidal nanoparticles.

专利号:US-3954585-A
优先权日:1974-02-21
标题 :Synthesis of trifluoromethyl-substituted compounds
发明人：LAGOW RICHARD J; GERCHMAN LOIS L; JACOB ROBERT A
权利人:MASSACHUSETTS INST TECHNOLOGY
摘要:Trifluoromethyl-substituted compounds are formed in a corona discharge or glow discharge plasma of trifluoromethyl radicals from an organic trifluoromethyl source. A substrate possessing easily replaceable ligands such as halogen or carbonyl, is initially contacted either in the plasma and within a short distance from a downstream visible edge of the plasma or outside of the visible portion of the plasma and within a short distance from the downstream visible edge, to effect a substitution of the halogen or carbonyl ligand on the substrate with a trifluoromethyl radical without substantial decomposition of the substrate.

专利号:US-8445695-B2
优先权日:2003-10-31
标 题 :Synthesis of phosphono-substituted porphyrin compounds for attachment to metal oxide surfaces
发明人：LINDSEY JONATHAN S; LOEWE ROBERT S; MUTHUKUMARAN KANNAN; AMBROISE AROUNAGUIRY
权利人:LINDSEY JONATHAN S; LOEWE ROBERT S; MUTHUKUMARAN KANNAN; AMBROISE AROUNAGUIRY; UNIV NORTH CAROLINA STATE; ZETTACORE INC
摘要:A method of making a phosphono-substituted dipyrromethane comprises reacting an aldehyde or acetal having at least one phosphono group substituted thereon with pyrrole to produce a phosphono-substituted dipyrromethane; and wherein the phosphono is selected from the group consisting of dialkyl phosphono, diaryl phosphono, and dialkylaryl phosphono. Additional methods, intermediates and products are also described.

专利号:US-8129520-B2
优先权日:2003-06-06
标题 :Methods and intermediates for the synthesis of dipyrrin-substituted porphyrinic macrocycles
发明人：YU LIANHE; MUTHUKUMARAN KANNAN; SREEDHARAN PRATHAPAN; LINDSEY JONATHAN S
权利人:YU LIANHE; MUTHUKUMARAN KANNAN; SREEDHARAN PRATHAPAN; LINDSEY JONATHAN S; UNIV NORTH CAROLINA STATE
摘要:The present invention provides dipyrrin substituted porphyrinic macrocycles, intermediates useful for making the same, and methods of making the same. Such compounds may be used for purposes including the making of molecular memory devices, solar cells and light harvesting arrays.

专利号:US-7022862-B2
优先权日:2003-08-15
标 题:Scalable synthesis of dipyrromethanes
发明人：LINDSEY JONATHAN S; DHANALEKSHMI SAVITHRI; LAHA JOYDEV K; TANIGUCHI MASAHIKO
权利人:UNIV NORTH CAROLINA STATE
摘要:A (preferably nonaqueous) method of making a dipyrromethane is described. The comprises the steps of: (a) providing a reaction system consisting essentially of an aldehyde or acetal, excess pyrrole and a catalyst; (b) reacting the aldehyde or acetal with the pyrrole in the reaction system to form the dipyrromethane therein; (c) quenching the reaction system by adding a base thereto (preferably without simultaneously or concurrently adding water and/or an organic solvent thereto); (d) separating the catalyst from the reaction system; and then (e) separating the pyrrole from the reaction system to produce the dipyrromethane as a residual