CAS: 2408-37-9; 2,2,6-Trimethylcyclohexanone

相似化合物

1193-47-1 1195-93-3 2230-70-8

上下游产品

ethanol 1-hydroxy-2,2,6-trimethyl-cyclohexanecarbonitrile 2,2-dimethyl-cyclohexanone 1-(α-hydroxy-isopropyl)-2-methyl-cyclopentanol 1-hydroxy-2,2,6-trimethyl-cyclohexanecarbonitrile 2,2,6-trimethyl-1-prop-2-ynyl-cyclohexanol 1-ethoxyethynyl-2,2,6-trimethyl-cyclohexanol 2,2,6,6-tetramethylcyclohexanone

📜2,6,6-三甲基-2-环己烯-1,4-二酮置于氢气体系中,用16%的收率获得2,2,6-三甲基环己酮
参考文献:Method For Synthesis Of 2,2,6-Trimethylcyclohexan-1-One
标题:Method For Synthesis Of 2,2,6-Trimethylcyclohexan-1-One
摘要:本发明涉及一种通过在气相中在氧化物催化剂存在下对2,6,6-三甲基-2-环己烯-1,4-二酮(酮异香叶酮,Kip)进行部分还原来合成2,2,6-三甲基环己烷-1-酮(tmch)的方法.

专利信息

专利号:US-10011580-B2
优先权日:2016-04-21
标题:Diastereoselective synthesis of (±)-epianastrephin, (±)-anastrephin and analogs thereof
发明人：WALSE SPENCER S; KUZMICH DANIEL
权利人:US AGRICULTURE
摘要:A process for the synthesis of trans-fused γ-lactones having Formula (IV) from substituted cyclic ketones having Formula (I). A diastereoselective synthesis of (±)-epianastrephin (1) (wherein: R 1 is ethenyl, R 2 and R 3 is methyl, and n is 1), (±)-anastrephin (2) (wherein: R 2 is ethenyl, R 1 and R 3 is methyl and n is 1), and analogs thereof (wherein: R 1 is H, C 1-5 alkyl, C 2-6 alkenyl or C 2-6 alkynyl, R 2 is H, C 1-5 alkyl, C 2-6 alkenyl or C 2-6 alkynyl, R 1 and R 2 together with the carbon atom they are attached form a C 3-6 cycloalkyl ring, R 3 is C 1-5 alkyl and n is 0-2):

专利号:US-2005027142-A1
优先权日:2003-08-01
标题 :Method for synthesis of 2,2,6-trimethylcyclohexan-1-one
发明人：KLEINFELD SUSANNE; FISCHER ACHIM; WILZ FRANK; WECKBECKER CHRISTOPH; HUTHMACHER KLAUS
权利人:DEGUSSA
摘要:The present invention relates to a method for synthesis of 2,2,6-trimethylcyclohexan-1-one (TMCH) by partial reduction of 2,6,6-trimethyl-2-cyclohexen-1,4-dione (ketoisophorone, KIP), the reaction being carried out in the gas phase in the presence of oxide catalysts.

专利号:US-5808120-A
优先权日:1995-08-22
标 题 :Method of synthesis of retinoic acid
发明人：DELUCA HECTOR F; TADIKONDA PRAVEEN K
权利人:WISCONSIN ALUMNI RES FOUND
摘要:A method of synthesizing 9-cis-retinoic acid, all-trans-retinoic acid or 9-nor-retinoic acid is disclosed. The method comprises the steps of adding a Grignard reagent of ##STR1## to 2,2,6 trimethyl cyclohexanone is disclosed. R is a methyl group or H and the CH 2 --OH group is in either the cis or trans orientation relative to the HC.tbd.C- group. The resulting product is converted into retinoic acid. In the preferable form of the present invention, a tritium-labelled retinoic acid is synthesized, wherein the labelling is at the C 20 position. A preparation of tritium-labelled 9-cis-retinoic acid with a specific activity of greater than 65 Ci/mmol is also enclosed. In a most preferred embodiment, the specific activity is greater than 75 Ci/mmol.

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

专利号:US-4661641-A
优先权日:1983-06-09
标题 :Substituted alkynes useful as intermediates in the synthesis of carotenoids
发明人：LUKAC TEODOR; SOUKUP MILAN; WIDMER ERICH
权利人:HOFFMANN LA ROCHE
摘要:Compounds of the formula ##STR1## wherein n is either 0 or 1; R 1 and R 2 is hydrogen and the other is hydrogen, hydroxy, oxo group, a protected hydroxy or protected oxo group; R 3 is hydroxy oxo group, â• CH--CH 2 --OH, â• CH--CHO or one of the foregoing groups where the hydroxy or oxo functions are protected; R 4 is --CO--OR 6 , --CO--R 6 , --CO--NR 6 R 7 , --CO--Cl or --SO 2 --R 6 ; R 6 is saturated or aromatic hydrocarbon; and R 7 is saturated or aromatic hydrocarbon or hydrogen, n are converted by cleavage of R 4 OH into corresponding cycloalkenes and protecting groups, if present, are hydrolyzed. n The compounds obtained are valuable intermediates in carotenoid syntheses.