专利号:US-2024425890-A1 优先权日:2022-02-11 标 题:Process for the synthesis of alpha-methylene-gamma-butyrolactone 发明人:TADEN ANDREAS; BECK HORST; MYRTOLLARI KAMELA; KOURIST ROBERT; NIGL ANDREA 权利人:HENKEL AG & CO KGAA 摘要:The present application provides a process for the preparation of α-methylene-γ-butyrolactone, said process comprising the steps of:a) acetylating the C1-hydroxyl group of isoprenol to yield isoprenyl acetate;b) forming 4-acetoxy-2-methylene-butan-1-ol from said isoprenyl acetate by whole cell biotransformation, said step comprising:i) contacting a cell (CB) with a culture medium containing said isoprenyl acetate or with a culture medium contiguous with an organic phase containing said isoprenyl acetate under conditions that enable the cell to form 4-acetoxy-2-methylene-butan-1-ol from isoprenyl acetate; and,ii) optionally isolating the resultant 4-acetoxy-2-methylene-butan-1-ol, wherein said cell (CB) exhibits activity of at least one alkane monooxygenase enzyme which catalyzes the formation of 4-acetoxy-2-methylene-butan-1-ol from isoprenyl acetate;c) oxidizing said 4-acetoxy-2-methylene-butan-1-ol to yield 4-acetoxy-2-methylene butyric acid; and,d) converting said 4-acetoxy-2-methylene butyric acid to α-methylene-γ-butyrolactone by hydroxylysis to γ-hydroxy-α-methylenebutyric acid and subsequent cyclization of said γ-hydroxy-α-methylenebutyric acid.
专利号:US-2005209355-A1 优先权日:2004-03-22 标 题:[Novel Reactions and the Products of Such Reactions] 发明人:ROITMAN LIPA L 权利人:ROITMAN LIPA L 摘要:A process for the synthesis of novel compounds is described comprising reacting tetrachloroethylene with substances containing active methylene group in the presence of free radical initiators. Also, a process for grafting tetrachloroethylene is described comprising reacting these compounds with polymers containing active methylene group in the presence of free radical initiators. Furthermore, a method of conducting such reactions to high conversion is described, comprising conducting the reactions in the reflux condensate. The present invention provides a novel and high yield route for heretofore unobtainable materials.
专利号:US-8455655-B2 优先权日:2010-05-07 标题:Preparation of dihydropyridines 发明人:VISHNU NEWADKAR RAVINDRANATH; PURUSHOTTAM JOSHI ANIL; KUMAR SINGH SANTOSH 权利人:VISHNU NEWADKAR RAVINDRANATH; PURUSHOTTAM JOSHI ANIL; KUMAR SINGH SANTOSH; LESVI LABORATORIOS SL 摘要:The invention relates to a method and compounds for the preparation of clevidipine butyrate, a very short acting hypertensive calcium antagonist, as well as the synthesis of these compounds useful for the preparation of clevidipine (also known as clevidipine butyrate). Moreover the invention also discloses polymorphic forms of clevidipine butyrate, useful for the preparation of pharmaceutical compositions, and processes to prepare them.
专利号:US-12163079-B2 优先权日:2019-08-12 标 题 :Synthesis of blue-emitting ZnSe1-xTex alloy nanocrystals with low full width at half-maximum 发明人:NEWMEYER BENJAMIN; IPPEN CHRISTIAN; MA RUIQING 权利人:SHOEI CHEMICAL IND CO 摘要:The invention pertains to the field of nanotechnology. The invention provides highly luminescent nanostructures, particularly highly luminescent nanostructures comprising a ZnSe 1-x Te x core and ZnS and/or ZnSe shell layers. The nanostructures comprising a ZnSe 1-x Te x core and ZnS and/or ZnSe shell layers display a low full width at half-maximum and a high quantum yield. The invention also provides methods of producing the nanostructures.
专利号:US-2021238374-A1 优先权日:2020-02-04 标 题 :Templated synthesis of nanovoided polymers 发明人:YE SHENG; LANDIG RENATE EVA KLEMENTINE; DIEST KENNETH ALEXANDER; OUDERKIRK ANDREW JOHN; BOWMAN CHARLES ROBERT; BOWMAN ROBERT G; HENDRICKSON WILLIAM ARTHUR; RUEB CHRISTOPHER J; PURVIS II LAFE JOSEPH; SUN WENMO; LI RYAN; YAROSHCHUK OLEG; RAO TINGLING; BOROMAND ARMAN; ZHAO CHURNING; Khaleghimeybodi Morteza 权利人:FACEBOOK TECH LLC 摘要:A method of forming a voided polymer includes forming a polymerizable composition containing a polymer precursor and a solid templating agent, forming a coating of the polymerizable composition, processing the coating to form a cured polymer material having a solid phase in a plurality of defined regions, and removing at least a portion of the solid phase from the cured polymer material to form a voided polymer layer.
专利号:US-8053161-B2 优先权日:2006-09-25 标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition 发明人:WADA KENJI; SAEGUSA HIROSHI 权利人:FUJIFILM CORP 摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.
摘要:Journal of Industrial Hygiene and Toxicology., 23(259), 1941 摘要:Patty's Industrial Hygiene and Toxicology, 3rd rev. ed., Clayton, G.D., and F.E. Clayton, eds., New York, John Wiley & Sons, Inc., 1978-82. Vol. 3 originally pub. in 1979; pub. as 2n rev. ed. in 1985., 2C(4027), 1982 摘要:Yalkowsky SH, Dannenfelser RM; The AQUASOL DataBase of Aqueous Solubility V5, Tucson, AZ: Univ AZ, College of Pharmacy (1992) 摘要:Lewis RJ Sr; Hawley's Condensed Chemical Dictionary 15th ed NY, NY: John Wiley and Sons, Inc p. 419 (2007) 摘要:40 CFR 712.30 (USEPA); U.S. National Archives and Records Administration's Electronic Code of Federal Regulations. Available from, as of June 9, 2009: https://www.ecfr.gov