CAS: 4667-99-6; Chlorotriethoxysilane

相似化合物

17898-38-3 4668-00-2 68988-57-8

上下游产品

tetraethoxy orthosilicate ethanol dichlorodiethoxysilane benzoyl chloridetetraethoxy orthosilicate ethyltriethoxy silane diethyldiethoxysilane triethoxyethynylsilane

三乙氧基硅烷置于三氯异氰尿酸,Copper(L) Chloride体系中,用 二氯甲烷 作为反应溶剂,化学反应 4.0H,反应生成 三乙氧基氯硅烷
参考文献:一种三乙氧基氯硅烷的工业化合成方法
标题:一种三乙氧基氯硅烷的工业化合成方法
摘要:本发明涉及有机合成领域,为解决以三乙氧基硅烷为原料,采用氯化反应制备三乙氧基氯硅烷存在副产物含量高,三乙氧基氯硅烷选择性低等缺陷,本发明提出一种以三氯异氰尿酸为氯化试剂,卤代金属盐为添加剂,将三乙氧基硅烷转化为三乙氧基氯硅烷的方法,具有三乙氧基硅烷转化率高,副产物含量低,三乙氧基氯硅烷选择性高,分离负荷小的优点,尤其适合工业化制备三乙氧基氯硅烷.

专利信息

专利号:US-6242614-B1
优先权日:1999-05-28
标 题:Semi-synthesis of paclitaxel using dialkyldichlorosilanes
发明人：VEMISHETTI PURUSHOTHAM; GIBSON FRANCIS S; DILLON JOHN L
权利人:BRISTOL MYERS SQUIBB CO
摘要:A process for the synthesis of paclitaxel from 10-deacetylbaccatin-III which is protected at the 7-position with a dialkylalkoxysilyl protecting group having the formula —Si(R) 2 (OR′).

专利号:US-6103942-A
优先权日:1999-04-08
标题:Method of high purity silane preparation
发明人：TSUO Y SIMON; BELOV EUGENE P; GERLIVANOV VADIM G; ZADDE VITALI V; KLESCHEVNIKOVA SOLOMONIDA I; KORNEEV NIKOLAI N; LEBEDEV EUGENE N; PINOV AKHSARBEK B; RYABENKO EUGENE A; STREBKOV DMITRY S; CHERNYSHEV EUGENE A
权利人:MIDWEST RESEARCH INST
摘要:A process for the preparation of high purity silane, suitable for forming thin layer silicon structures in various semiconductor devices and high purity poly- and single crystal silicon for a variety of applications, is provided. Synthesis of high-purity silane starts with a temperature assisted reaction of metallurgical silicon with alcohol in the presence of a catalyst. Alcoxysilanes formed in the silicon-alcohol reaction are separated from other products and purified. Simultaneous reduction and oxidation of alcoxysilanes produces gaseous silane and liquid secondary products, including, active part of a catalyst, tetra-alcoxysilanes, and impurity compounds having silicon-hydrogen bonds. Silane is purified by an impurity adsorption technique. Unreacted alcohol is extracted and returned to the reaction with silicon. Concentrated mixture of alcoxysilanes undergoes simultaneous oxidation and reduction in the presence of a catalyst at the temperature -20 DEG C. to +40 DEG C. during 1 to 50 hours. Tetra-alcoxysilane extracted from liquid products of simultaneous oxidation and reduction reaction is directed to a complete hydrolysis. Complete hydrolysis of tetra-alcoxysilane results in formation of industrial silica sol and alcohol. Alcohol is dehydrated by tetra-alcoxysilane and returned to the reaction with silicon.

专利号:US-11691883-B2
优先权日:2018-09-10
标题:Synthesis of trichlorosilane from tetrachlorosilane and hydridosilanes
发明人：AUNER NORBERT; STURM ALEXANDER G
权利人:MOMENTIVE PERFORMANCE MAT INC
摘要:The invention relates to a process for the preparation of trichlorosilane (HSiCl3) which comprises the reaction of tetrachlorosilane (SiCU) with hydridosilanes in the presence of a catalyst.

专利号:US-8889334-B2
优先权日:2001-11-15
标题:Spin-on anti-reflective coatings for photolithography
发明人：KENNEDY JOSEPH T; BALDWIN-HENDRICKS TERESA
权利人:HONEYWELL INT INC
摘要:Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

专利号:US-2023044510-A1
优先权日:2021-07-13
标题:Silylation of Copolymers Comprising Para-Methylstyrene: Synthesis and Composites Thereof
发明人：LIN TZU-PIN; HUANG GANG; CANICH JO ANN M; CAI IRENE C; ROHDE BRIAN J
权利人:EXXONMOBIL CHEMICAL PATENTS INC
摘要:A composition, including: a copolymer including units derived from ethylene, one or more α-olefins, one or more substituted styrene compounds, and a pendant alkoxy silane group. A method was disclosed to incorporate pendant alkoxy silyl groups onto the benzylic positions. The silane-functionalized polymers show ability to cure with water. Additionally, blends of silane-functionalized polymers exhibit improved filler acceptance.

专利号:JP-2003502290-A
优先权日:1999-05-28
标 题 :Semi-synthesis of paclitaxel using dialkyldichlorosilane