CAS: 541-85-5; 5-Methyl-3-Heptanone

相似化合物

19594-40-2 6137-11-7 18720-65-5

上下游产品

5-methyl-hepta-1,4-dien-3-one 3-oxo-5-methyl-1-heptene 5-methyl-3-heptanol 5-methyl-4-hepten-3-one 2-Benzenesulfinylmethyl-1,1,1-trifluoro-3,6-dimethyl-°Ctan-4-one 5-methyl-3-heptanone phenylhydrazone 3-methyl-2-(2-methylbutyl)indole 3-(2-butyl)-2-ethylindole

📜5-甲基-3-庚醇置于吡啶,氯体系中,用 氯仿 作为反应溶剂,化学反应生成 5-甲基-3-庚酮
参考文献:与氯配合物氧化.在多元醇中存在伯羟基的情况下,仲羟基的特异性氧化.
标题:与氯配合物氧化.在多元醇中存在伯羟基的情况下,仲羟基的特异性氧化.
摘要:
DOI:10.1016/s0040-4039(01)91821-0

专利信息

专利号:US-8053161-B2
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
发明人：WADA KENJI; SAEGUSA HIROSHI
权利人:FUJIFILM CORP
摘要:A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×10 4 or less.

专利号:US-9709891-B2
优先权日:2005-12-09
标 题:Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
发明人：KANDA HIROMI; KANNA SHINICHI
权利人:FUJIFILM CORP
摘要:A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent; and a pattern forming method using the positive resist composition.

专利号:US-8653223-B2
优先权日:2008-04-16
标题:Transketalized compositions, synthesis, and applications
发明人：SELIFONOV SERGEY; GOETZ ADAM EDWARD; JING FENG
权利人:SELIFONOV SERGEY; GOETZ ADAM EDWARD; JING FENG; SEGETIS INC
摘要:Ketal compounds of the structure I n nand a method of preparation of the compound from polyols and oxocarboxylates, as well as uses thereof.

专利号:US-2011269201-A1
优先权日:2010-04-30
标题:Redirected bioenergetics in recombinant cellulolytic clostridium microorganisms
发明人：GRAY KEVIN; O'MULLAN PATRICK
权利人:QTEROS INC
摘要:Compositions and methods are provided for redirecting metabolic solventogenesis pathways to enhance the product yield from fermentation of biomass. Clostridium microorganism pathways are modified to extend the growth phase and prevent inhibition of acetaldehyde while bypassing the synthesis of acetyl CoA.

专利号:US-8679724-B2
优先权日:2005-12-09
标题 :Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

专利号:US-2008081290-A1
优先权日:2006-09-25
标 题 :Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition