CAS: 5926-26-1; (Chloromethyl)Trimethoxysilane

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CAS号149-73-5 原甲酸三甲酯 | CAS号67-56-1 甲醇 | CAS号1445-45-0 原乙酸三甲酯 | CAS号1558-25-4 氯甲基三氯硅烷 | CAS号104697-13-4 trimethoxysilyl... | CAS号42003-39-4 氯甲基杂氮硅三烷 | CAS号22859-36-5 (甲氧基甲基)三甲氧基硅烷 | CAS号994-31-0 氯化三乙基锡 | CAS号77855-73-3 苯胺甲基三甲氧基硅烷 | CAS号54586-78-6 甲基丙烯酰氧甲基三甲氧基硅烷 | CAS号35501-22-5 N-butyl-N-(trim... | CAS号30817-94-8 (Trimethoxysily... | CAS号123271-16-9 N-Methyl-1-(tri...

甲醇,(氯甲基)三氯硅烷置于尿素体系中,用 乙醚 作为反应溶剂,化学反应 4.0H,以87%的收率获得产物一氯甲基三甲氧基硅烷
参考文献:(碘甲基)氟硅烷:合成与反应
标题:(碘甲基)氟硅烷:合成与反应
摘要:阐述了合成通式ich 2 Sime N F 3-N(n = 0,2)的双官能(碘甲基)氟硅烷的方法;结构通过1 H,13 C,29 Si NMR光谱证实.(碘甲基)二甲基氟硅烷与三氟乙酸的n,N'-二甲基酰肼的o-三甲基甲硅烷基衍生物反应,形成2,2,4,4-四甲基-6-(三氟甲基)-3,4-二氢-2 н-1,4,5,2-Oxadiasilin-4-鎓碘化物与四配位硅原子上.
DOI:10.1134/s1070363218100092

专利信息

专利号:US-7309799-B2
优先权日:2004-06-01
标 题:Methods for the synthesis of milnacipran and congeners thereof
发明人：BUCHWALD STEPHEN L; SWAGER TIMOTHY M; RARIY ROMAN V
权利人:COLLEGIUM PHARMACEUTICAL INC
摘要:One aspect of the present invention relates to methods for synthesizing milnacipran or congeners thereof. Another aspect of the present invention relates to asymmetric methods for synthesizing enantiomerically enriched milnacipran or congeners thereof. The present invention also relates to methods for synthesizing intermediates useful in the non-asymmetric or asymmetric methods for synthesizing enantiomerically enriched milnacipran or congeners thereof.

专利号:US-2003072716-A1
优先权日:2001-06-22
标 题:Renewable, carbohydrate based CO2-philes
发明人：POOVATHINTHODIYIL RAVEENDRAN; WALLEN SCOTT L
摘要:A composition is disclosed comprising a carbohydrate-based material a dispersed in carbon dioxide. A general method for synthesizing inexpensive, renewable, non-toxic, non-fluorous, carbohydrate based CO 2 -philes is disclosed. These CO 2 -philes are soluble in carbon dioxide. Methods of making the composition are also disclosed. The methods and composition are useful in a variety of applications and can utilize gaseous, liquid and supercritical carbon dioxide. The methods and compositions are useful in the synthesis of surfactants and metal chelates for CO 2 , as a sizing substrate, in CO 2 -based coating processes, for impregnation and plasticizing cellulosic and non-cellulosic materials, in pharmaceutical applications, such as crystallization, dispersion and encapsulation of bioactive molecules in solid systems, in the densification of CO 2 , in the synthesis of biodegradable polymers in CO 2 , and for carbon dioxide removal, to name just a few.

专利号:US-9884879-B2
优先权日:2011-06-14
标 题:Method of synthesizing siloxane monomers and use thereof
发明人：PAULASAARI JYRI
权利人:SILECS OY
摘要:A method for preparation and polymerization of siloxane monomers of Formula I is presented. The synthesis includes the selective reaction between silanol containing unit and alkoxy containing units in the presence of basic catalyst. The siloxane monomers of the invention can be used for preparation of siloxane polymers with good flexibility and cracking threshold, and functional sites, useful for applications requiring low metal content in semiconductor industry.

专利号:US-2005282898-A1
优先权日:2004-06-01
标 题 :Methods for the synthesis of milnacipran and congeners thereof

专利号:SU-596591-A1
优先权日:1974-08-05
标题 :Silyl esters of adamantane-1-carboxylic acids for synthesis of polyorganosiloxanes

专利号:US-8889334-B2
优先权日:2001-11-15
标题:Spin-on anti-reflective coatings for photolithography
发明人：KENNEDY JOSEPH T; BALDWIN-HENDRICKS TERESA
权利人:HONEYWELL INT INC
摘要:Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.